2001
Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances
OHLÍDAL, Ivan; Daniel FRANTA; Miloslav OHLÍDAL a Karel NAVRÁTILZákladní údaje
Originální název
Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances
Autoři
Vydání
Vacuum, USA, ELSEVIER (PERGAMON), 2001, 0042-207X
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
10306 Optics
Stát vydavatele
Spojené státy
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 0.541
Označené pro přenos do RIV
Ano
Kód RIV
RIV/00216224:14310/01:00004312
Organizační jednotka
Přírodovědecká fakulta
UT WoS
Klíčová slova anglicky
Thin films; Spectral reflectance; Optical parameters
Změněno: 25. 12. 2003 00:21, Mgr. Daniel Franta, Ph.D.
Anotace
V originále
In this contribution a new efficient modification of the method enabling us to perform the optical characterization of non-absorbing and weakly absorbing thin films without using the absolute values of the reflectances measured will be presented. Namely, this modification is based on determining the values of the wavelengths corresponding to the points of touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulae containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in both reliable and precise ways. This fact will be demonstrated through the optical characterization of non-absorbing films of silicon dioxide and weakly absorbing films of photoresist placed on silicon single crystal substrates. The results of this characterization will be compared with those achieved using a combined method of variable angle of incidence spectroscopic ellipsometry and near normal incidence spectroscopic reflectometry.
Návaznosti
| GA202/98/0988, projekt VaV |
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| GV106/96/K245, projekt VaV |
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| VS96084, projekt VaV |
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