Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds

ZAJÍČKOVÁ, Lenka, Pavel DVOŘÁK, Vilma BURŠÍKOVÁ, Vratislav PEŘINA, Anna MACKOVÁ, Vladislav NAVRÁTIL and Jan JANČA. Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds. In Proceedings of 15th International Symposium on Plasma Chemistry. Orleans (France): GREMI, CNRS/University of Orleans, 2001, p. 133-138.

Basic information

Original name

Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Pavel DVOŘÁK (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Vratislav PEŘINA (203 Czech Republic), Anna MACKOVÁ, Vladislav NAVRÁTIL (203 Czech Republic) and Jan JANČA (203 Czech Republic)

Edition

Orleans (France), Proceedings of 15th International Symposium on Plasma Chemistry, p. 133-138, 2001

Publisher

GREMI, CNRS/University of Orleans

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

France

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/01:00004510

Organization unit

Faculty of Science

Keywords in English

PECVD; Diamod-like carbon; Hardness; Optical emission spectroscopy ; ion density;

Tags

Diamod-like carbon, hardness, ion density, optical emission spectroscopy, PECVD

Tags

International impact, Reviewed

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Abstract

V originále

Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply.

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Links

GA202/00/P037, research and development project	Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
ME 301, research and development project	Name: Vývoj a průmyslová aplikace nových supertvrdých nanokrystalických kompozitních otěruvzdorných ochranných vrstev Investor: Ministry of Education, Youth and Sports of the CR, Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings
ME 367, research and development project	Name: Výzkum a vývoj supertvrdých nanokrystalických kompositních materiálů Investor: Ministry of Education, Youth and Sports of the CR, Research and development and industrializartion of novel super hard nanocrystalline materials
MSM 143100003, plan (intention)	Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project	Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate