VALTR, Miroslav, Lenka ZAJÍČKOVÁ and Siegmar RUDAKOWSKI. Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor. In JUNIORMAT 01. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2001, p. 277-278. ISBN 80-214-1885-0.
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Basic information
Original name Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor
Authors VALTR, Miroslav (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor) and Siegmar RUDAKOWSKI.
Edition 1. vyd. Brno, JUNIORMAT 01, p. 277-278, 2001.
Publisher ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/01:00005151
Organization unit Faculty of Science
ISBN 80-214-1885-0
Keywords in English plasma;polymer;films;argon;acetylene;pecvd;pulsed;radio frequency;discharge;profile
Tags acetylene, argon, discharge, films, PECVD, plasma, Polymer, profile, pulsed, radio frequency
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:41.
Abstract
Plasma polymer films were deposited from Argon and acetylene mixture by plasma enhanced chemical vapor deposition (PECVD) in pulsed radio frequency (13.56 MHz) discharges. The discharge on time varied from 50-150 ms and the off time was kept constant at 1900 ms. Rf power during the on time was set for 20 W. Deposition profiles along tubular plug-flow reactor were studied by spectroscopic ellipsometry in ultraviolet/visible range on films deposited on the silicon substrates.
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