| JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA a Pavel SLAVÍČEK. Diagnostics and Application of High Frequency Plasma Pencil. Plasma Chemistry and Plasma Processing. Bristol, England: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, roč. 21 (2001), č. 4, s. 565-580. ISSN 0272-4324. |
Další formáty:
BibTeX
LaTeX
RIS
@article{389372,
author = {Janča, Jan and Zajíčková, Lenka and Klíma, Miloš and Slavíček, Pavel},
article_location = {Bristol, England},
article_number = {4},
keywords = {High frequency discharge; plasma sources; plasma teratment; plasma-liquid technologies},
language = {eng},
issn = {0272-4324},
journal = {Plasma Chemistry and Plasma Processing},
title = {Diagnostics and Application of High Frequency Plasma Pencil},
volume = {21 (2001)},
year = {2001}
}
TY - JOUR
ID - 389372
AU - Janča, Jan - Zajíčková, Lenka - Klíma, Miloš - Slavíček, Pavel
PY - 2001
TI - Diagnostics and Application of High Frequency Plasma Pencil
JF - Plasma Chemistry and Plasma Processing
VL - 21 (2001)
IS - 4
SP - 565
EP - 565
PB - KLUWER ACADEMIC/PLENUM PUBLISHERS
SN - 02724324
KW - High frequency discharge
KW - plasma sources
KW - plasma teratment
KW - plasma-liquid technologies
N2 - High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized.
ER -
JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA a Pavel SLAVÍČEK. Diagnostics and Application of High Frequency Plasma Pencil. \textit{Plasma Chemistry and Plasma Processing}. Bristol, England: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, roč.~21 (2001), č.~4, s.~565-580. ISSN~0272-4324.
|
