CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ, M. KORMUNDA a Lenka ZAJÍČKOVÁ. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. Surface & coatings technology. Elsevier Science, 2002, roč. 2002, 151-152, s. 214-217. ISSN 0257-8972. |
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@article{402552, author = {Choukourov, A. and Pihosh, Y. and Stelmashuk, V. and Biederman, Hynek and Slavínská, D. and Kormunda, M. and Zajíčková, Lenka}, article_number = {151-152}, keywords = {Rf magnetron; sputtering; SiOx; plasma polymer films}, language = {eng}, issn = {0257-8972}, journal = {Surface & coatings technology}, title = {Rf sputtering of composite SiOx/plasma polymer films and their basic properties}, volume = {2002}, year = {2002} }
TY - JOUR ID - 402552 AU - Choukourov, A. - Pihosh, Y. - Stelmashuk, V. - Biederman, Hynek - Slavínská, D. - Kormunda, M. - Zajíčková, Lenka PY - 2002 TI - Rf sputtering of composite SiOx/plasma polymer films and their basic properties JF - Surface & coatings technology VL - 2002 IS - 151-152 SP - 214 EP - 214 PB - Elsevier Science SN - 02578972 KW - Rf magnetron KW - sputtering KW - SiOx KW - plasma polymer films N2 - Rf sputtering of composite SiOx/plasma polymer films and their basic properties ER -
CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ, M. KORMUNDA a Lenka ZAJÍČKOVÁ. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. \textit{Surface \&{} coatings technology}. Elsevier Science, 2002, roč.~2002, 151-152, s.~214-217. ISSN~0257-8972.
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