Optical characterization of thin films non-uniform in thickness
by a multiple-wavelength reflectance method

J 2002

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Daniel FRANTA; Tomáš KRÁLÍK; Miloš JÁKL et al.

Základní údaje

Originální název

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

Autoři

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Daniel FRANTA; Tomáš KRÁLÍK; Miloš JÁKL a Marek ELIÁŠ

Vydání

Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10306 Optics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 1.071

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/02:00007060

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000177885900143

Klíčová slova anglicky

non-uniform thin films; optical characterization

Štítky

non-uniform thin films, optical characterization

Změněno: 9. 8. 2005 11:40, Mgr. Marek Eliáš, Ph.D.

Anotace

V originále

An original method enabling us to characterize the non-uniformity of thin-film thickness is described. This method employs the interpretation of data obtained by multiple-wavelength reflectometry (MWR). Within this MWR method the values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry (VASE). The MWR method is then used to evaluate the values of the thickness along the area of the non-uniform film under investigation. Within the experimental set-up employed for applying the MWR method, a multi-wavelength laser is used as a light source. A CCD camera equipped with a zoom objective is utilized as a detector. A suitable beamsplitter allows to measure the values of the relative reflectance of the film against a reference sample with known reflectance. By using the set-up employed it is possible to characterize the thin-film spreading over large areas of substrates.

Návaznosti

GA101/01/1104, projekt VaV

Název: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Grantová agentura ČR, Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

GA202/01/1110, projekt VaV

Název: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Grantová agentura ČR, Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Citovat

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Daniel FRANTA; Tomáš KRÁLÍK; Miloš JÁKL a Marek ELIÁŠ. Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, roč. 34, č. 1, s. 660-663. ISSN 0142-2421.

@article{407704,
   author = {Ohlídal, Miloslav and Ohlídal, Ivan and Franta, Daniel and Králík, Tomáš and Jákl, Miloš and Eliáš, Marek},
   article_location = {USA},
   article_number = {1},
   keywords = {non-uniform thin films; optical characterization},
   language = {eng},
   issn = {0142-2421},
   journal = {Surface and Interface Analysis},
   title = {Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method},
   url = {http://hydra.physics.muni.cz/~franta/bib/SIA34_660.html},
   volume = {34},
   year = {2002}
}

TY  - JOUR
ID  - 407704
AU  - Ohlídal, Miloslav - Ohlídal, Ivan - Franta, Daniel - Králík, Tomáš - Jákl, Miloš - Eliáš, Marek
PY  - 2002
TI  - Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method
JF  - Surface and Interface Analysis
VL  - 34
IS  - 1
SP  - 660-663
EP  - 660-663
PB  - John Wiley & Sons
SN  - 01422421
KW  - non-uniform thin films
KW  - optical characterization
UR  - http://hydra.physics.muni.cz/~franta/bib/SIA34_660.html
N2  - An original method enabling us to characterize the non-uniformity of thin-film thickness is described. This method employs the interpretation of data obtained by multiple-wavelength reflectometry (MWR). Within this MWR method the values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry (VASE). The MWR method is then used to evaluate the values of the thickness along the area of the non-uniform film under investigation. Within the experimental set-up employed for applying the MWR method, a multi-wavelength laser is used as a light source. A CCD camera equipped with a zoom objective is utilized as a detector. A suitable beamsplitter allows to measure the values of the relative reflectance of the film against a reference sample with known reflectance. By using the set-up employed it is possible to characterize the thin-film spreading over large areas of substrates.
ER  -

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Daniel FRANTA; Tomáš KRÁLÍK; Miloš JÁKL a Marek ELIÁŠ. Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2002, roč.~34, č.~1, s.~660-663. ISSN~0142-2421.

Přehled o publikaci