KUČEROVÁ, Zuzana, Lenka ZAJÍČKOVÁ and Vilma BURŠÍKOVÁ. Plasma enhanced CVD of organisilicon plasma polymers. In WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media. 1st ed. Prague: Matfyzpress, 2003, p. 330-334. ISBN 80-86732-18-5.
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Basic information
Original name Plasma enhanced CVD of organisilicon plasma polymers
Name in Czech Plasma enhanced CVD of organisilicon plasma polymers
Authors KUČEROVÁ, Zuzana (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor) and Vilma BURŠÍKOVÁ (203 Czech Republic).
Edition 1. vyd. Prague, WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media, p. 330-334, 5 pp. 2003.
Publisher Matfyzpress
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
ISBN 80-86732-18-5
Keywords in English PECVD; FTIR; HMDSO; SiOx
Tags FTIR, HMDSO, PECVD, SiOx
Tags Reviewed
Changed by Changed by: doc. RNDr. Vilma Buršíková, Ph.D., učo 2418. Changed: 8/2/2008 20:24.
Abstract
We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films.
Abstract (in Czech)
We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films.
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