| KRÁĽ, Martin, Andrej BUČEK, H. GLESKOVÁ, Mirko ČERNÁK, H. KOBAYASHI, Jaroslav RUSNÁK, Miroslav ZÁHORAN, Róbert BRUNER a Emil PINČÍK. Electronic Properties of Very Thin Native SiO2/a-Si:H Interfaces and Their Comparison With Those Prepared by Both Dielectric Barrier Discharge Oxidation at Atmospheric Pressure and by Chemical Oxidation. Acta Physica Slovaca. Slovakia, 2005, roč. 55/2005, č. 4, s. 373-378, 5 s. ISSN 0323-0465. |
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@article{599326,
author = {Kráľ, Martin and Buček, Andrej and Glesková, H. and Černák, Mirko and Kobayashi, H. and Rusnák, Jaroslav and Záhoran, Miroslav and Bruner, Róbert and Pinčík, Emil},
article_location = {Slovakia},
article_number = {4},
keywords = {Thin; SiO2/a-Si:H; Interfaces},
language = {eng},
issn = {0323-0465},
journal = {Acta Physica Slovaca},
title = {Electronic Properties of Very Thin Native SiO2/a-Si:H Interfaces and Their Comparison With Those Prepared by Both Dielectric Barrier Discharge Oxidation at Atmospheric Pressure and by Chemical Oxidation},
volume = {55/2005},
year = {2005}
}
TY - JOUR
ID - 599326
AU - Kráľ, Martin - Buček, Andrej - Glesková, H. - Černák, Mirko - Kobayashi, H. - Rusnák, Jaroslav - Záhoran, Miroslav - Bruner, Róbert - Pinčík, Emil
PY - 2005
TI - Electronic Properties of Very Thin Native SiO2/a-Si:H Interfaces and Their Comparison With Those Prepared by Both Dielectric Barrier Discharge Oxidation at Atmospheric Pressure and by Chemical Oxidation
JF - Acta Physica Slovaca
VL - 55/2005
IS - 4
SP - 373-378
EP - 373-378
SN - 03230465
KW - Thin
KW - SiO2/a-Si:H
KW - Interfaces
N2 - Electronic Properties of Very Thin Native SiO2/a-Si:H Interfaces and Their Comparison With Those Prepared by Both Dielectricboth dielectric barrier discharge oxidation at atmospheric pressure and by chemical exidation
ER -
KRÁĽ, Martin, Andrej BUČEK, H. GLESKOVÁ, Mirko ČERNÁK, H. KOBAYASHI, Jaroslav RUSNÁK, Miroslav ZÁHORAN, Róbert BRUNER a Emil PINČÍK. Electronic Properties of Very Thin Native SiO2/a-Si:H Interfaces and Their Comparison With Those Prepared by Both Dielectric Barrier Discharge Oxidation at Atmospheric Pressure and by Chemical Oxidation. \textit{Acta Physica Slovaca}. Slovakia, 2005, roč.~55/2005, č.~4, s.~373-378, 5 s. ISSN~0323-0465.
|
