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@inproceedings{609764, author = {Zajíčková, Lenka and Buršíková, Vilma and Valtr, Miroslav and Peřina, Vratislav and Macková, Anna and Houdková, Jana}, address = {Toronto, Kanada}, booktitle = {17th International Symposium on Plasma Chemistry}, keywords = {DLC; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD}, language = {eng}, location = {Toronto, Kanada}, note = {6ti stránková verze článku včetně poděkování grantům je publikována na CD-ROMu (součást sborníku) pod názvem Zajickova_ID333.pdf}, pages = {589-590}, publisher = {University of Toronto Press Inc.}, title = {Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane}, year = {2005} }
TY - JOUR ID - 609764 AU - Zajíčková, Lenka - Buršíková, Vilma - Valtr, Miroslav - Peřina, Vratislav - Macková, Anna - Houdková, Jana PY - 2005 TI - Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane PB - University of Toronto Press Inc. CY - Toronto, Kanada N1 - 6ti stránková verze článku včetně poděkování grantům je publikována na CD-ROMu (součást sborníku) pod názvem Zajickova_ID333.pdf KW - DLC KW - PECVD KW - Hexamethyldisiloxane KW - RF discharge KW - RBS KW - ERD N2 - In present paper we give some new results on our previously reported hard DLC/SiOx films deposited from the mixtures of CH4 and HMDSO and compare them with similar films deposited from CH4/HMDSO/H2 mixtures using a different generator. We show that significant drawbacks of the DLC films, high intrinsic stress, bad thermal stability and absorption in the visible range, can be limited by an incorporation of the SiOx component and we notice that this conclusion is achieved for many DLC/SiOx films in spite of the different method of preparation and, more surprisingly, of their different structure. However, particular film properties can be further improved by an optimization of the deposition conditions as concluded from the higher hardness of the films deposited from the CH4/HMDSO/H2 compared to the CH4/HMDSO feed. ER -
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Miroslav VALTR, Vratislav PEŘINA, Anna MACKOVÁ and Jana HOUDKOVÁ. Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane. In \textit{17th International Symposium on Plasma Chemistry}. Toronto, Kanada: University of Toronto Press Inc., 2005, p.~589-590.
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