Další formáty:
BibTeX
LaTeX
RIS
@inproceedings{634207,
author = {Bochníček, Zdeněk and Čechal, Jan and Šikola, Tomáš and Krčmář, Jan},
address = {Budapest, Hungary},
booktitle = {22nd European Crystallographic Meeting, Abstracts},
keywords = {PtSi; silicide; x-ray diffraction;},
language = {eng},
location = {Budapest, Hungary},
isbn = {9639319406},
pages = {279-279},
publisher = {ECM 22},
title = {PtSi formation on silicon substrate},
year = {2004}
}
TY - JOUR
ID - 634207
AU - Bochníček, Zdeněk - Čechal, Jan - Šikola, Tomáš - Krčmář, Jan
PY - 2004
TI - PtSi formation on silicon substrate
PB - ECM 22
CY - Budapest, Hungary
SN - 9639319406
KW - PtSi
KW - silicide
KW - x-ray diffraction;
N2 - Silicidation of Pt layer deposited on Silicon substrate has been studied by in-situ x-ray diffraction. From the kinetics of Pt2Si and PtSi formation using Kissinger analysis the activation energies has been calculated. It has bee found that silicidation is strongly influenced by the presence of nitrogen in annealing ambient.
ER -
BOCHNÍČEK, Zdeněk. PtSi formation on silicon substrate. In ČECHAL, Jan, Tomáš ŠIKOLA a Jan KRČMÁŘ. \textit{22nd European Crystallographic Meeting, Abstracts}. Budapest, Hungary: ECM 22, 2004, s.~279. ISBN~9639319406.
|
