Detailed Information on Publication Record
2007
Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Daniel FRANTA, Angelique BOUSQUET, Agnes GRANIER et. al.Basic information
Original name
Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges
Name in Czech
Srovnávací studie vrstev připravených z HMDSO/O2 v kontinuálních a pulzních vf výbojích
Authors
ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Angelique BOUSQUET (250 France), Agnes GRANIER (250 France), Antoine GOULLET (250 France) and Jiří BURŠÍK (203 Czech Republic)
Edition
Plasma processes and polymers, Weinheim, Wiley-VCH, 2007, 1612-8850
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Germany
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 2.132
RIV identification code
RIV/00216224:14310/07:00022256
Organization unit
Faculty of Science
UT WoS
000207735200058
Keywords in English
PECVD; hexamethyldisiloxane; oxygen; CCP; ICP
Tags
Tags
International impact, Reviewed
Změněno: 17/7/2007 17:57, doc. Mgr. Lenka Zajíčková, Ph.D.
V originále
We have performed a comparative study of the properties of films deposited in the rf CCP discharges from a mixture of 5% of hexamethyldisiloxane in oxygen at two different pressures 2.5 and 40 Pa in continuous and pulsed modes. Changes in optical and especially mechanical properties of the films were observed due to differing pressure. Slight changes in the properties were also achieved by pulsing the discharge. Films deposited at 2.5 Pa exhibited very low compressive stress and hardness from 5.5 to 6.9 GPa. Soft films of 1.6 GPa maximum hardness possessing a tensile stress and containing more CH3-related groups were deposited at a pressure of 40 Pa. Hard SiO2-like films (11-13.5 GPa) were deposited from the same mixture in the ICP mode of a helicon reactor at the pressure of 0.3 Pa at which the CCP discharge could not be sustained. These films possessed relatively high compressive stress. Increasing off-time up to 15 ms caused a slight decrease in the hardness and in the case of 0.3 Pa ICP films a significant decrease in the compressive stress. The film optical properties were obtained using a model parameterizing the density of states. According to this model, the band gap was found in the range of 7.4-8.2 eV. The films deposited in the CCP exhibited a small absorption peak in UV due to an existence of localized defect states at about 5 eV.
In Czech
Zabývali jsme se srovnávací studií vlastností vrstev připravených ve vf kapacitně vázaném výboji z 5% směsi hexametyldisiloxanu v kyslíku při dvou různých tlacích 2.5 and 40 Pa v kontinuálním a pulzním módu. Změny optických a zejména mechanických vlastností vrstev byly pozorovány v důsledku odlišného tlaku. Malá změna vlastností byla rovněž dosažena pulzováním výboje.
Links
| MSM0021622411, plan (intention) |
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| 1K05025, research and development project |
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