Deposition of thin films on glass substrate in atmospheric
pressure glow discharge

D 2007

Deposition of thin films on glass substrate in atmospheric pressure glow discharge

ŠÍRA, Martin; Vilma BURŠÍKOVÁ a David TRUNEC

Základní údaje

Originální název

Deposition of thin films on glass substrate in atmospheric pressure glow discharge

Název česky

Depozice tenkých vrstev v atmosférickém doutnavém výboji na skleněný substrát.

Autoři

ŠÍRA, Martin; Vilma BURŠÍKOVÁ a David TRUNEC

Vydání

Bratislava, Slovensko, Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics, od s. 144-147, 4 s. 2007

Nakladatel

Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Slovensko

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/07:00020681

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-80-89186-24-2

Klíčová slova anglicky

atmospheric pressure glow discharge; thin films

Štítky

atmospheric pressure glow discharge, thin films

Příznaky

Mezinárodní význam

Změněno: 18. 12. 2007 12:18, Mgr. Martin Šíra, Ph.D.

Anotace

ORIG CZ

V originále

The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound (hexamethyldisiloxane HMDSO) which was used as a monomer. Thin films was deposited on the glass substrate. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of Xray Photoelectron Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range. The comparison with thin films deposited on the silicon substrate is provided.

Česky

Doutnavý výboj za atmosférického tlaku byl použit k depozici tenkých vrstev na skleněný substrát z monomeru hexamethyldisiloxanu (HMDSO).

Návaznosti

GA202/06/1473, projekt VaV

Název: Depozice tenkých vrstev v dielektrických bariérových výbojích za atmosférického tlaku

Investor: Grantová agentura ČR, Depozice tenkých vrstev v dielektrických bariérových výbojích za atmosférického tlaku

Citovat

ŠÍRA, Martin; Vilma BURŠÍKOVÁ a David TRUNEC. Deposition of thin films on glass substrate in atmospheric pressure glow discharge. In Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics. Bratislava, Slovensko: Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia, 2007, s. 144-147. ISBN 978-80-89186-24-2.

@inproceedings{746187,
   author = {Šíra, Martin and Buršíková, Vilma and Trunec, David},
   address = {Bratislava, Slovensko},
   booktitle = {Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics},
   keywords = {atmospheric pressure glow discharge; thin films},
   language = {eng},
   location = {Bratislava, Slovensko},
   isbn = {978-80-89186-24-2},
   pages = {144-147},
   publisher = {Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia},
   title = {Deposition of thin films on glass substrate in atmospheric pressure glow discharge},
   year = {2007}
}

TY  - CONF
ID  - 746187
AU  - Šíra, Martin - Buršíková, Vilma - Trunec, David
PY  - 2007
TI  - Deposition of thin films on glass substrate in atmospheric pressure glow discharge
PB  - Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia
CY  - Bratislava, Slovensko
SN  - 9788089186242
KW  - atmospheric pressure glow discharge
KW  - thin films
N2  - The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound (hexamethyldisiloxane HMDSO) which was used as a monomer. Thin films was deposited on the glass substrate. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of Xray Photoelectron Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range. The comparison with thin films deposited on the silicon substrate is provided.
ER  -

ŠÍRA, Martin; Vilma BURŠÍKOVÁ a David TRUNEC. Deposition of thin films on glass substrate in atmospheric pressure glow discharge. In \textit{Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics}. Bratislava, Slovensko: Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia, 2007, s.~144-147. ISBN~978-80-89186-24-2.

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