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@inproceedings{773067,
author = {Dvořák, Pavel and Vašina, Petr},
address = {Praha},
booktitle = {Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology},
keywords = {higher harmonics; plasma; discharge; reactive sputtering; magnetron},
language = {eng},
location = {Praha},
isbn = {978-80-01-04030-0},
pages = {91-92},
publisher = {CVUT v Praze},
title = {Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process},
year = {2008}
}
TY - JOUR
ID - 773067
AU - Dvořák, Pavel - Vašina, Petr
PY - 2008
TI - Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process
PB - CVUT v Praze
CY - Praha
SN - 9788001040300
KW - higher harmonics
KW - plasma
KW - discharge
KW - reactive sputtering
KW - magnetron
N2 - A new method to control whether a radio-freguency (RF) reactive sputtering deposition processes runs in a pre-adjusted experimental conditions was proposed. The frequency spectrum of the cathode voltage and of the voltage on an uncompensated probe immersed in the plasma was measured and it was proved, that some of the harmonics are extremely sensitive markers of the transition between the metallic and the compound mode of the RF sputtering.
ER -
DVOŘÁK, Pavel and Petr VAŠINA. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process. In \textit{Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology}. Praha: CVUT v Praze, 2008, p.~91-92, 1 pp. ISBN~978-80-01-04030-0.
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