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@article{800639,
author = {Eliáš, Marek and Souček, Pavel and Vašina, Petr},
article_number = {S4},
keywords = {hysteresis; reactive sputtering; hybrid deposition process},
language = {eng},
issn = {1803-2389},
journal = {Chemické listy},
title = {Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering},
url = {http://www.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/4322/4267},
volume = {102},
year = {2008}
}
TY - JOUR
ID - 800639
AU - Eliáš, Marek - Souček, Pavel - Vašina, Petr
PY - 2008
TI - Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering
JF - Chemické listy
VL - 102
IS - S4
SP - 1506-1509
EP - 1506-1509
SN - 18032389
KW - hysteresis
KW - reactive sputtering
KW - hybrid deposition process
UR - http://www.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/4322/4267
N2 - The paper study deposition rate of boron based thin films prepared by means of hybrid PVD-PECVD process and derive conclusions about process behaviour. Paper, interdisciplinary study of plasma physics
ER -
ELIÁŠ, Marek, Pavel SOUČEK and Petr VAŠINA. Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering. \textit{Chemické listy}. 2008, vol.~102, S4, p.~1506-1509. ISSN~1803-2389.
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