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@proceedings{808472,
author = {Bursikova, Vilma and Valtr, Miroslav and Klapetel, Petr and Bursik, Jiri and Blahova, Olga and Ohlidal, Ivan},
keywords = {Nanoindentation; amorphous carbon films; plasma enchanced chemical vapor deposition},
language = {eng},
title = {Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition},
year = {2008}
}
TY - CONF
ID - 808472
AU - Bursikova, Vilma - Valtr, Miroslav - Klapetel, Petr - Bursik, Jiri - Blahova, Olga - Ohlidal, Ivan
PY - 2008
TI - Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition
KW - Nanoindentation
KW - amorphous carbon films
KW - plasma enchanced chemical vapor deposition
N2 - In the past two decades, there is a great industrial interest in preparation of amorphous hydrogenated carbon (a-C:H) thin films in a wide range of applications such as nanoelectronics, optical devices, integrated digital circuits, micro-electromechanical devices (MEMs), biomedical coatings, etc. The mechanical properties such as hardness, wear resistance, fracture toughness, film-substrate adhesion, thermo-mechanical stability of the coating-substrate system play always a crucial role for industrial applications of the films.
ER -
BURSIKOVA, Vilma, Miroslav VALTR, Petr KLAPETEL, Jiri BURSIK, Olga BLAHOVA a Ivan OHLIDAL. \textit{Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition}. Online. 2008, [citováno 2024-04-23]
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