Spectroscopic ellipsometry and polarimetry for materials and
systems analysis at the nanometer scale: state-of-the-art,
potential, and perspectives

J 2009

Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET et al.

Základní údaje

Originální název

Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives

Název česky

Spektroskopická elipsometrie a polarimetrie materiálů and systémová analýza na nanometrové škále: současný stav, potenciál a perspektivy

Autoři

Vydání

Journal of Nanoparticle Research, Dordrecht, Springer Netherlands, 2009, 1388-0764

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 2.478

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/09:00037726

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000270543100001

Klíčová slova česky

Spektroskopická elipsometrie; Polarimetrie; Nanomateriály; Nanočástice.

Klíčová slova anglicky

Spectroscopic ellipsometry; Polarimetry; Nanomaterials; Nanoparticles; Thin films; Optical characterization; Nanometrology.

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 10. 1. 2011 11:06, prof. RNDr. Josef Humlíček, CSc.

Anotace

ORIG CZ

V originále

This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale.

Česky

Tato práce diskutuje základy, aplikace, potenciál, omezení a perspektivy polarizačních reflexních technik pro charakterizaci materiálů a systémů na nanometrovém měřítku.

Návaznosti

MSM0021622410, záměr

Název: Fyzikální a chemické vlastnosti pokročilých materiálů a struktur

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Fyzikální a chemické vlastnosti pokročilých materiálů a struktur

Citovat

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET; A. DE MARTINO; K. FLEISCHER; Z. DOHCEVIC-MITROVIC; N. ESSER; M. GAILLET; R. GAJIC; Dušan HEMZAL; K. HINGERL; Josef HUMLÍČEK; R. OSSIKOVSKI; Z.V. POPOVIC a O. SAXL. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. Journal of Nanoparticle Research. Dordrecht: Springer Netherlands, 2009, roč. 11, č. 7, s. 1521-1554. ISSN 1388-0764.

@article{861755,
   author = {Losurdo, Maria and Bergmair, Michael and Bruno, Giovanni and Catellan, D. and Cobet, C. and de Martino, A. and Fleischer, K. and DohcevicandMitrovic, Z. and Esser, N. and Gaillet, M. and Gajic, R. and Hemzal, Dušan and Hingerl, K. and Humlíček, Josef and Ossikovski, R. and Popovic, Z.V. and Saxl, O.},
   article_location = {Dordrecht},
   article_number = {7},
   keywords = {Spectroscopic ellipsometry; Polarimetry; Nanomaterials; Nanoparticles; Thin films; Optical characterization; Nanometrology.},
   language = {eng},
   issn = {1388-0764},
   journal = {Journal of Nanoparticle Research},
   title = {Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives},
   volume = {11},
   year = {2009}
}

TY  - JOUR
ID  - 861755
AU  - Losurdo, Maria - Bergmair, Michael - Bruno, Giovanni - Catellan, D. - Cobet, C. - de Martino, A. - Fleischer, K. - Dohcevic-Mitrovic, Z. - Esser, N. - Gaillet, M. - Gajic, R. - Hemzal, Dušan - Hingerl, K. - Humlíček, Josef - Ossikovski, R. - Popovic, Z.V. - Saxl, O.
PY  - 2009
TI  - Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives
JF  - Journal of Nanoparticle Research
VL  - 11
IS  - 7
SP  - 1521-1554
EP  - 1521-1554
PB  - Springer Netherlands
SN  - 13880764
KW  - Spectroscopic ellipsometry
KW  - Polarimetry
KW  - Nanomaterials
KW  - Nanoparticles
KW  - Thin films
KW  - Optical characterization
KW  - Nanometrology.
N2  - This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale.
ER  -

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET; A. DE MARTINO; K. FLEISCHER; Z. DOHCEVIC-MITROVIC; N. ESSER; M. GAILLET; R. GAJIC; Dušan HEMZAL; K. HINGERL; Josef HUMLÍČEK; R. OSSIKOVSKI; Z.V. POPOVIC a O. SAXL. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. \textit{Journal of Nanoparticle Research}. Dordrecht: Springer Netherlands, 2009, roč.~11, č.~7, s.~1521-1554. ISSN~1388-0764.

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