| KUBĚNA, Josef, Alan KUBĚNA, Ondřej CAHA a Mojmír MEDUŇA. Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing. J.Phys.: Condens. Matter. Velká Britanie: IOP Publishing Ltd, roč. 21, č. 10, s. 105402-105412. ISSN 0953-8984. 2009. |
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@article{862549,
author = {Kuběna, Josef and Kuběna, Alan and Caha, Ondřej and Meduňa, Mojmír},
article_location = {Velká Britanie},
article_number = {10},
keywords = {Silicon; vacancies; Interstitials; nucleation},
language = {eng},
issn = {0953-8984},
journal = {J.Phys.: Condens. Matter},
title = {Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing},
volume = {21},
year = {2009}
}
TY - JOUR
ID - 862549
AU - Kuběna, Josef - Kuběna, Alan - Caha, Ondřej - Meduňa, Mojmír
PY - 2009
TI - Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing
JF - J.Phys.: Condens. Matter
VL - 21
IS - 10
SP - 105402
EP - 105402
PB - IOP Publishing Ltd
SN - 09538984
KW - Silicon
KW - vacancies
KW - Interstitials
KW - nucleation
N2 - The kinetics of the vacancy and self interstitial processes in Si wafers are studied in this paper. Detailed insight into nucleation processes, out diffusion and vacancy interstitial recombination during the RTA leads to a new model of interaction between vacancies and oxygen.
ER -
KUBĚNA, Josef, Alan KUBĚNA, Ondřej CAHA a Mojmír MEDUŇA. Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing. \textit{J.Phys.: Condens. Matter}. Velká Britanie: IOP Publishing Ltd, roč.~21, č.~10, s.~105402-105412. ISSN~0953-8984. 2009.
|
