| TRUNEC, David, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Filip STUDNIČKA, Pavel SŤAHEL, Vadym PRYSIAZHNYI, Vratislav PEŘINA, Jana HOUDKOVÁ, Zdeněk NAVRÁTIL a Daniel FRANTA. Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge. Journal of Physics D: Applied Physics. Bristol, England: IOP Publishing Ltd., roč. 43, č. 22, s. 225403-225410. ISSN 0022-3727. 2010. |
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@article{883750,
author = {Trunec, David and Zajíčková, Lenka and Buršíková, Vilma and Studnička, Filip and Sťahel, Pavel and Prysiazhnyi, Vadym and Peřina, Vratislav and Houdková, Jana and Navrátil, Zdeněk and Franta, Daniel},
article_location = {Bristol, England},
article_number = {22},
keywords = {thin film deposition; atmospheric pressure discharge},
language = {eng},
issn = {0022-3727},
journal = {Journal of Physics D: Applied Physics},
title = {Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge},
url = {http://iopscience.iop.org/0022-3727/43/22/225403/pdf/0022-3727_43_22_225403.pdf},
volume = {43},
year = {2010}
}
TY - JOUR
ID - 883750
AU - Trunec, David - Zajíčková, Lenka - Buršíková, Vilma - Studnička, Filip - Sťahel, Pavel - Prysiazhnyi, Vadym - Peřina, Vratislav - Houdková, Jana - Navrátil, Zdeněk - Franta, Daniel
PY - 2010
TI - Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge
JF - Journal of Physics D: Applied Physics
VL - 43
IS - 22
SP - 225403
EP - 225403
PB - IOP Publishing Ltd.
SN - 00223727
KW - thin film deposition
KW - atmospheric pressure discharge
UR - http://iopscience.iop.org/0022-3727/43/22/225403/pdf/0022-3727_43_22_225403.pdf
N2 - An atmospheric pressure dielectric barrier discharge burning in nitrogen with a small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, and the substrate temperature during the deposition process was increased up to values within the range 25 - 150 C in order to obtain hard SiOx-like thin films.
ER -
TRUNEC, David, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Filip STUDNIČKA, Pavel SŤAHEL, Vadym PRYSIAZHNYI, Vratislav PEŘINA, Jana HOUDKOVÁ, Zdeněk NAVRÁTIL a Daniel FRANTA. Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge. \textit{Journal of Physics D: Applied Physics}. Bristol, England: IOP Publishing Ltd., roč.~43, č.~22, s.~225403-225410. ISSN~0022-3727. 2010.
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