JAŠEK, Ondřej, Petr SYNEK, Vít KUDRLE, Peter ZELINA, Vilma BURŠÍKOVÁ, Bohumil DAVID, Naděžda PIZÚROVÁ, Renata HANZLÍKOVÁ a Antonín REK. Nanocrystalline layer deposition by organometallic compound deposition in microwave discharges. In Potential and applications of surface nanotreatment of polymers and glass : Book of Extended Abstracts. 1. vyd. Brno: NANOcontact, Masaryk University, 2010, s. 25. |
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@inproceedings{905458, author = {Jašek, Ondřej and Synek, Petr and Kudrle, Vít and Zelina, Peter and Buršíková, Vilma and David, Bohumil and Pizúrová, Naděžda and Hanzlíková, Renata and Rek, Antonín}, address = {Brno}, booktitle = {Potential and applications of surface nanotreatment of polymers and glass : Book of Extended Abstracts}, edition = {1}, keywords = {nanocrystalline layer; iron pentacarbonyl; plasma; low-pressure discharge; microwave discharge}, language = {eng}, location = {Brno}, pages = {25-25}, publisher = {NANOcontact, Masaryk University}, title = {Nanocrystalline layer deposition by organometallic compound deposition in microwave discharges}, year = {2010} }
TY - JOUR ID - 905458 AU - Jašek, Ondřej - Synek, Petr - Kudrle, Vít - Zelina, Peter - Buršíková, Vilma - David, Bohumil - Pizúrová, Naděžda - Hanzlíková, Renata - Rek, Antonín PY - 2010 TI - Nanocrystalline layer deposition by organometallic compound deposition in microwave discharges PB - NANOcontact, Masaryk University CY - Brno KW - nanocrystalline layer KW - iron pentacarbonyl KW - plasma KW - low-pressure discharge KW - microwave discharge N2 - Microwave plasma torch (2,45 GHz, 300 W power) operating at atmospheric pressure and low pressure (several kPa) surface wave microwave discharge are used for deposition of nanocrystalline layers on various substrates such as silicon or glass. Both discharges are ignited in Ar and organometallic compound is introduced into the discharge. Thin layers are deposited on the substrate placed in direction of the gas flow. In case of microwave plasma torch the deposition temperature is varied from 100 to 700 Celsius degrees. Deposited films are analyzed by scanning electron microscopy (SEM) and energy-dispersive x-ray (EDX) analysis. Mechanical properties of the films are also evaluated. ER -
JAŠEK, Ondřej, Petr SYNEK, Vít KUDRLE, Peter ZELINA, Vilma BURŠÍKOVÁ, Bohumil DAVID, Naděžda PIZÚROVÁ, Renata HANZLÍKOVÁ a Antonín REK. Nanocrystalline layer deposition by organometallic compound deposition in microwave discharges. In \textit{Potential and applications of surface nanotreatment of polymers and glass : Book of Extended Abstracts}. 1. vyd. Brno: NANOcontact, Masaryk University, 2010, s.~25.
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