2011
Optimized Plasma Enhanced Chemical Vapor Deposition from HMDSO/O2 for Surface Protection of Metals
MURESAN, Mihai George; Lenka ZAJÍČKOVÁ; Václav PEKAŘ; Vilma BURŠÍKOVÁ; Pavel ONDRAČKA et al.Základní údaje
Originální název
Optimized Plasma Enhanced Chemical Vapor Deposition from HMDSO/O2 for Surface Protection of Metals
Autoři
MURESAN, Mihai George; Lenka ZAJÍČKOVÁ; Václav PEKAŘ; Vilma BURŠÍKOVÁ; Pavel ONDRAČKA ORCID; Anna CAMPBELLOVÁ; Vratislav PEŘINA a Romana MIKŠOVÁ
Vydání
3rd International Conference Nanocon, Brno, 2011
Další údaje
Jazyk
angličtina
Typ výsledku
Konferenční abstrakt
Obor
10305 Fluids and plasma physics
Stát vydavatele
Česká republika
Utajení
není předmětem státního či obchodního tajemství
Označené pro přenos do RIV
Ano
Kód RIV
RIV/00216224:14310/11:00050062
Organizační jednotka
Přírodovědecká fakulta
Klíčová slova anglicky
SiO2; Aluminium; Steel; PECVD
Změněno: 5. 12. 2011 13:57, Mihai George Muresan, Ph.D., M.Sc.
Anotace
V originále
The coatings were obtained from mixtures of hexamethyldisiloxane (HMDSO) with oxygen using a radio frequency capacitively coupled glow discharge at 13.56 MHz. Deposition of SiO2-like films from 8% HMDSO/O2 were found to have low internal stress, high fracture toughness and high hardness. Different pressures were used in order to obtain the best properties of the films. These dual purpose films can be used as a transparent protective coatings for aluminum substrates or a intermediate layer for harder coatings with good adhesion on stainless steel. The films were optically characterized by spectroscopic ellipsometry and reflectometry. Complete atomic composition was determined by ion beam analysis (RBS/ERDA). Infrared spectroscopy was used for the chemical bonds assessment. Hardness, elastic modulus and scratch test were performed. Surface energy measurements indicated hydrophilic character of the coatings, an important factor for industrial applications. This work was supported by the Czech Ministry of Education, under project MSM 0021622411 the Grant Agency of Czech Republic project GACR 104/09/H080.
Návaznosti
| GD104/09/H080, projekt VaV |
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| MSM0021622411, záměr |
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