| SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC a Mirko ČERNÁK. Plasma treatment of silicon surface by DCSBD. Acta Technica CSAV. Praha, ČR: ČSAV Praha, 2011, Volume 56, č. 2011, s. 356-361. ISSN 0001-7043. |
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@article{953447,
author = {Skácelová, Dana and Sťahel, Pavel and Haničinec, Martin and Černák, Mirko},
article_location = {Praha, ČR},
article_number = {2011},
keywords = {Silicon surface plasma treatment DBD discharge AFM contact angle measurement},
language = {eng},
issn = {0001-7043},
journal = {Acta Technica CSAV},
title = {Plasma treatment of silicon surface by DCSBD},
volume = {Volume 56},
year = {2011}
}
TY - JOUR
ID - 953447
AU - Skácelová, Dana - Sťahel, Pavel - Haničinec, Martin - Černák, Mirko
PY - 2011
TI - Plasma treatment of silicon surface by DCSBD
JF - Acta Technica CSAV
VL - Volume 56
IS - 2011
SP - 356-361
EP - 356-361
PB - ČSAV Praha
SN - 00017043
KW - Silicon surface plasma treatment DBD discharge AFM contact angle measurement
N2 - This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness.
ER -
SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC a Mirko ČERNÁK. Plasma treatment of silicon surface by DCSBD. \textit{Acta Technica CSAV}. Praha, ČR: ČSAV Praha, 2011, Volume 56, č.~2011, s.~356-361. ISSN~0001-7043.
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