| BURŠÍKOVÁ, Vilma, Olga BLÁHOVÁ, Monika KARÁSKOVÁ, Lenka ZAJÍČKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Petr KLAPETEK a Jiří BURŠÍK. Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges. Online. CHEMICKÉ LISTY. Praha: Česká společnost chemická, 2011, roč. 105, CHLSAC 105, s. 98 - 101. ISSN 0009-2770. [citováno 2024-04-24] |
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@article{966868,
author = {Buršíková, Vilma and Bláhová, Olga and Karásková, Monika and Zajíčková, Lenka and Jašek, Ondřej and Franta, Daniel and Klapetek, Petr and Buršík, Jiří},
article_location = {Praha},
article_number = {CHLSAC 105},
keywords = {ultrananocrystalline diamond; plasma enhanced chemical vapor deposition; dual frequency discharge; local mechanical properties},
language = {eng},
issn = {0009-2770},
journal = {CHEMICKÉ LISTY},
title = {Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges},
url = {http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf},
volume = {105},
year = {2011}
}
TY - JOUR
ID - 966868
AU - Buršíková, Vilma - Bláhová, Olga - Karásková, Monika - Zajíčková, Lenka - Jašek, Ondřej - Franta, Daniel - Klapetek, Petr - Buršík, Jiří
PY - 2011
TI - Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges
JF - CHEMICKÉ LISTY
VL - 105
IS - CHLSAC 105
SP - 98 - 101
EP - 98 - 101
PB - Česká společnost chemická
SN - 00092770
KW - ultrananocrystalline diamond
KW - plasma enhanced chemical vapor deposition
KW - dual frequency discharge
KW - local mechanical properties
UR - http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf
L2 - http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf
N2 - The present paper describes the deposition of nanostruc- tured diamond films with low surface roughness, high hard- ness and fracture toughness by microwave PECVD in the ASTeX type reactor from mixture of methane and hydrogen. Films were deposited on a mirror polished (111) oriented n- doped silicon substrate. The film exhibited relatively low roughness, the root mean square (RMS) of heights ranged from 20 to 9.1 nm, depending on the deposition conditions. The hardness was found to be in the range from 22 to 65 GPa and the elastic modulus ranged from 220 to 375 GPa, depend- ing on the film structure
ER -
BURŠÍKOVÁ, Vilma, Olga BLÁHOVÁ, Monika KARÁSKOVÁ, Lenka ZAJÍČKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Petr KLAPETEK a Jiří BURŠÍK. Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges. Online. \textit{CHEMICKÉ LISTY}. Praha: Česká společnost chemická, 2011, roč.~105, CHLSAC 105, s.~98 - 101. ISSN~0009-2770. [citováno 2024-04-24]
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