HAZDRA, Pavel, Volodymyr KOMARNITSKYY and Vilma BURŠÍKOVÁ. Hydrogenation of platinum introduced in silicon by radiation enhanced diffusion. Materials Science and Engineering. Lausanne: ELSEVIER SCIENCE SA, 2009, vol. 2008, 159-60, p. 342-345. ISSN 0921-5107. Available from: https://dx.doi.org/10.1016/j.mseb.2008.11.038.
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Basic information
Original name Hydrogenation of platinum introduced in silicon by radiation enhanced diffusion
Authors HAZDRA, Pavel (203 Czech Republic, guarantor), Volodymyr KOMARNITSKYY (804 Ukraine) and Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution).
Edition Materials Science and Engineering, Lausanne, ELSEVIER SCIENCE SA, 2009, 0921-5107.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 20201 Electrical and electronic engineering
Country of publisher Netherlands
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.715
RIV identification code RIV/00216224:14310/09:00056770
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.mseb.2008.11.038
UT WoS 000267635500081
Keywords (in Czech) difúze; hydrogenace; platina ; křemík
Keywords in English diffusion; hydrogenation; platinum; silicon
Tags IK, rivok, ZR
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 20/4/2012 12:18.
Abstract
The paper deals with hydrogenation of platinum atoms introduced in silicon by radiation enhanced diffusion. The interaction of defects and arising deep levels are investigated by means of deep level transient spectroscopy.
Abstract (in Czech)
Článek je zaměřen na hydrogenaci atomů platina v křemíku pomocí radiačně podporované difúze. Defekty jsou studovány zejména pomocí deep level transient spectroscopy.
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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