Masaryk University

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    2007

    1. Experimental study of a pre-ionized high power pulsed magnetron discharge
      VAŠINA, Petr, Marcel MEŠKO, Jean-Christophe IMBERT, Mihai GANCIU, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES, Michel TOUZEAU, Daniel PAGNON and Jean BRETAGNE. Experimental study of a pre-ionized high power pulsed magnetron discharge. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2007, vol. 2007, No 16, p. 501-510. ISSN 0963-0252.
      Name in Czech: Experimenetální studie preionizovaného pulzního magnetronu velkého výkonu
      Name (in English): Experimental study of a pre-ionized high power pulsed magnetron discharge
      RIV/00216224:14310/07:00032077 Article in a journal. Plasma physics and discharge through gases. English. United Kingdom of Great Britain and Northern Ireland.
      Vašina, Petr (203 Czech Republic, guarantor) -- Meško, Marcel (703 Slovakia) -- Imbert, Jean-Christophe (250 France) -- Ganciu, Mihai (642 Romania) -- Boisse-Laporte, Caroline (250 France) -- de Poucques, Ludovic (250 France) -- Touzeau, Michel (250 France) -- Pagnon, Daniel (250 France) -- Bretagne, Jean (250 France)
      Keywords in English: magnetron; sputtering; high power pulses
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 27/3/2010 10:46.
      More: https://is.muni.cz/publication/719139/en

    2005

    1. Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge
      DE POUCQUES, Ludovic, Jean-Christophe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULÉ-GAY, Jean BRETAGNE and Michel TOUZEAU. Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge. Surface and Coating Technology. New York: ELSEVIER, 2005, vol. 200, 1-4, p. 800-803, 3 pp. ISSN 0257-8972.
      Name in Czech: Srovnání ionizační účinnosti mikrovlnného a radio-frekvenčního výboje doprovázejícího magnetronový výboje
      Name (in English): Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge
      RIV/00216224:14310/05:00012904 Article in a journal. Plasma physics and discharge through gases. English. United States of America.
      de Poucques, Ludovic (250 France) -- Imbert, Jean-Christophe (250 France) -- Vašina, Petr (203 Czech Republic, guarantor) -- Boisse-Laporte, Caroline (250 France) -- Teulé-Gay, Lionel (250 France) -- Bretagne, Jean (250 France) -- Touzeau, Michel (250 France)
      Keywords in English: IPVD; sputtering; magnetron discharge; microwave discharge; RF discharge; absorption spectroscopy
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 23/2/2006 14:53.
      More: https://is.muni.cz/publication/596504/en
    2. Reduction of transient regime in fast preionized high power pulsed magnetron discharge
      VAŠINA, Petr, Marcel MEŠKO, Mihai GANCIU, Jean BRETAGNE, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES and Michel TOUZEAU. Reduction of transient regime in fast preionized high power pulsed magnetron discharge. Europhysics Letters. Paríž: European Physical Society, 2005, vol. 72, No 3, p. 390-395, 5 pp. ISSN 0295-5075.
      Name in Czech: Omezení pechodového režimu pi pulzním magnetronovém naprašování
      Name (in English): Reduction of transient regime in fast preionized high power pulsed magnetron discharge
      RIV/00216224:14310/05:00012968 Article in a journal. Plasma physics and discharge through gases. English. France.
      Vašina, Petr (203 Czech Republic, guarantor) -- Meško, Marcel (703 Slovakia) -- Ganciu, Mihai (642 Romania) -- Bretagne, Jean (250 France) -- Boisse-Laporte, Caroline (250 France) -- de Poucques, Ludovic (250 France) -- Touzeau, Michel (250 France)
      Keywords in English: pulsed magnetron; sputtering; preionization
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 23/2/2006 16:01.
      More: https://is.muni.cz/publication/599364/en

    2002

    1. Rf sputtering of composite SiOx/plasma polymer films and their basic properties
      CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ, M. KORMUNDA and Lenka ZAJÍČKOVÁ. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. Surface & coatings technology. Elsevier Science, 2002, vol. 2002, 151-152, p. 214-217. ISSN 0257-8972.
      RIV/00216224:14310/02:00005643 Article in a journal. Plasma physics and discharge through gases. English. Netherlands.
      Choukourov, A. (804 Ukraine) -- Pihosh, Y. (804 Ukraine) -- Stelmashuk, V. (804 Ukraine) -- Biederman, Hynek (203 Czech Republic) -- Slavínská, D. (203 Czech Republic) -- Kormunda, M. (203 Czech Republic) -- Zajíčková, Lenka (203 Czech Republic, guarantor)
      Keywords in English: Rf magnetron; sputtering; SiOx; plasma polymer films
      International impact: yes
      Reviewed: yes
      Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:57.
      More: https://is.muni.cz/publication/402552/en
Displayed: 29/5/2024 16:36