F4280 Thin Films Deposition and Surface Modification Technologies

Faculty of Science
Spring 2011
Extent and Intensity
2/1/0. 3 credit(s) (plus extra credits for completion). Type of Completion: k (colloquium).
prof. Mgr. Petr Vašina, Ph.D. (lecturer)
doc. Mgr. Lenka Zajíčková, Ph.D. (lecturer)
Mgr. Petr Synek, Ph.D. (seminar tutor)
prof. RNDr. David Trunec, CSc.
Department of Physical Electronics - Physics Section - Faculty of Science
Contact Person: prof. Mgr. Petr Vašina, Ph.D.
Wed 16:00–18:50 F1,01014
Course Enrolment Limitations
The course is also offered to the students of the fields other than those the course is directly associated with.
Fields of study the course is directly associated with
there are 7 fields of study the course is directly associated with, display
Course objectives
The course should provide the basic overview of all important methods used to deposit new materials in form of thin films and about methods to modify the surfaces. The student gets awared about principles and technologies of vacuum evaporation, sputtering methods, etching and surface modification as well as chemical vapour deposition or plasma enhanced chemical vapour deposition. Additionaly some of the processes will be shown in real work.
  • Overview of thin film deposition procedures
  • Evaporation
  • Molecular epitaxy
  • Chemical vapour depositon
  • Plasma enhanced chemical vapour depositon
  • Physical vapour deposition
  • Magnetron sputtering
  • Reactive magnetron sputtering
  • D. Depla et al Reactive sputter depositon, Springer Series in Material Science 109 2008
Assessment methods
individual talk
Language of instruction
Further Comments
Study Materials
The course is taught annually.
The course is also listed under the following terms Spring 2011 - only for the accreditation, Spring 2009, Spring 2010, Spring 2012, spring 2012 - acreditation, Spring 2013, Spring 2014, Spring 2015, Spring 2016, Spring 2017, spring 2018, Spring 2019.
  • Enrolment Statistics (Spring 2011, recent)
  • Permalink: https://is.muni.cz/course/sci/spring2011/F4280