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@article{1616966,
author = {Sládek, Petr and Sťahel, Pavel and Theye, ML and ROCA I CABARROCAS, Pere},
article_location = {Nizozemsko},
article_number = {PART 1},
doi = {http://dx.doi.org/10.1016/S0022-3093(98)00186-0},
keywords = {hydrogen; SiGe; hydrogen effusion},
language = {eng},
issn = {0022-3093},
journal = {Journal of Non-Crystalline Solids},
title = {The hydrogen effusion induced structural changes and defects in hydrogenated amorphous SiGe films: dependence upon the microstructure},
volume = {227},
year = {1998}
}
TY - JOUR
ID - 1616966
AU - Sládek, Petr - Sťahel, Pavel - Theye, ML - ROCA I CABARROCAS, Pere
PY - 1998
TI - The hydrogen effusion induced structural changes and defects in hydrogenated amorphous SiGe films: dependence upon the microstructure
JF - Journal of Non-Crystalline Solids
VL - 227
IS - PART 1
SP - 437-441
EP - 437-441
PB - Elsevier Science B.V.
SN - 00223093
KW - hydrogen
KW - SiGe
KW - hydrogen effusion
N2 - To better understand the relations between deposition conditions, microstructure, H incorporation and the optoelectronics properties of undoped a-Si(1-x)Ge(x):H alloys, we performed a comparative study of samples (with x approximate to 0.5) prepared by plasma enhanced chemical vapour deposition at total pressures varying from 900 to 2200 mTorr. The hydrogen bonding, detected by infra-red absorption measurements and H thermal desorption experiments, as well as the optoelectronic properties, determined by a combination of standard optical and photothermal deflection spectroscopy measurements, were found to depend on the total pressure. The results obtained in the as-deposited state and after annealing at increasing temperatures are analysed as a whole in terms of specific local H bonding environment, degree of order, and defects. (C) 1998 Elsevier Science B.V. All rights reserved.
ER -
SLÁDEK, Petr, Pavel SŤAHEL, ML THEYE a Pere ROCA I CABARROCAS. The hydrogen effusion induced structural changes and defects in hydrogenated amorphous SiGe films: dependence upon the microstructure. \textit{Journal of Non-Crystalline Solids}. Nizozemsko: Elsevier Science B.V., 1998, roč.~227, PART 1, s.~437-441. ISSN~0022-3093. Dostupné z: https://dx.doi.org/10.1016/S0022-3093(98)00186-0.
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