1998
Defect states in the intrinsic layer of amorphous silicon solar cells studied by the Constant Photocurrent Method
SLÁDEK, Petr; Pavel SŤAHEL; Pere ROCA I CABARROCAS a Philip MORINZákladní údaje
Originální název
Defect states in the intrinsic layer of amorphous silicon solar cells studied by the Constant Photocurrent Method
Autoři
SLÁDEK, Petr; Pavel SŤAHEL; Pere ROCA I CABARROCAS a Philip MORIN
Vydání
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, London, England, TAYLOR & FRANCIS LTD, 1998, 0141-8637
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
10302 Condensed matter physics
Stát vydavatele
Velká Británie a Severní Irsko
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 1.241
Označené pro přenos do RIV
Ano
Organizační jednotka
Pedagogická fakulta
UT WoS
EID Scopus
Klíčová slova anglicky
amorphous silicon; solar cells; CPM
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 3. 2. 2020 15:49, Dana Nesnídalová
Anotace
V originále
The constant-photocurrent method (CPM), which has been widely used for the study of the defect density in the gap of hydrogenated amorphous silicon (a-Si:H) films, is applied to study the defect density in the intrinsic layer of a-Si:H-based solar cells. The analysis of the CPM-derived absorption spectrum in p-i-n devices indicates that reliable measurements can be performed under short-circuit or reverse-bias conditions. In these conditions the CPM measurement is limited by the transport of holes and therefore is a good indicator of the quality of the intrinsic layer. Moreover, we show that CPM is sensitive to that part of the i layer in which the Fermi level is around midgap. Comparison of CPM spectra in films and cells is used to determine the conditions under which the measurements in the solar cell are relative to the properties of the intrinsic layer or sensitive to interface effects. Deconvolution of the CPM spectrum according to a standard model of the defect density distribution in a-Si:H yields similar values of the defect density and disorder parameter for films and devices deposited under the same conditions.