BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Deepak Prasad SUBEDI and Jan JANČA. Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films. In Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases. Miskolc - Lillafüred, Hungary: European Physical Society, 2000, p. 408-409.
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Basic information
Original name Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films
Authors BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Pavel DVOŘÁK (203 Czech Republic), Deepak Prasad SUBEDI (524 Nepal) and Jan JANČA (203 Czech Republic).
Edition Miskolc - Lillafüred, Hungary, Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, p. 408-409, 2000.
Publisher European Physical Society
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Hungary
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/00:00003103
Organization unit Faculty of Science
Keywords in English PECVD; Diamond-like Carbon; Protective thin films; Silicon doping;
Tags Diamond-like Carbon, PECVD, Protective thin films, Silicon doping
Tags International impact
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:37.
Abstract
Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties.
Links
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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