Influence of Discharge Parameters on Composition of Films
Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

D 2000

Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

ZAJÍČKOVÁ, Lenka; Vratislav PEŘINA; Vilma BURŠÍKOVÁ; Anna MACKOVÁ; Jan JANČA et. al.

Basic information

Original name

Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor); Vratislav PEŘINA; Vilma BURŠÍKOVÁ (203 Czech Republic); Anna MACKOVÁ and Jan JANČA (203 Czech Republic)

Edition

Miskolc - Lillafüred, Hungary, Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, p. 448-449, 2000

Publisher

European Physical Society

Other information

Language

English

Type of outcome

Proceedings paper

Field of Study

10305 Fluids and plasma physics

Country of publisher

Hungary

Confidentiality degree

is not subject to a state or trade secret

RIV identification code

RIV/00216224:14310/00:00003105

Organization unit

Faculty of Science

Keywords in English

Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate

Abstract

In the original language

The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique.

Links

MSM 143100003, plan (intention)

Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

VS96084, research and development project

Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague

Cite

ZAJÍČKOVÁ, Lenka; Vratislav PEŘINA; Vilma BURŠÍKOVÁ; Anna MACKOVÁ and Jan JANČA. Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures. In Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases. Miskolc - Lillafüred, Hungary: European Physical Society, 2000, p. 448-449.

@inproceedings{357861,
   author = {Zajíčková, Lenka and Peřina, Vratislav and Buršíková, Vilma and Macková, Anna and Janča, Jan},
   address = {Miskolc - Lillafüred, Hungary},
   booktitle = {Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases},
   keywords = {Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate},
   language = {eng},
   location = {Miskolc - Lillafüred, Hungary},
   pages = {448-449},
   publisher = {European Physical Society},
   title = {Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures},
   year = {2000}
}

TY  - CONF
ID  - 357861
AU  - Zajíčková, Lenka - Peřina, Vratislav - Buršíková, Vilma - Macková, Anna - Janča, Jan
PY  - 2000
TI  - Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures
PB  - European Physical Society
CY  - Miskolc - Lillafüred, Hungary
KW  - Thin Films
KW  - PECVD
KW  - Hexamethyldisiloxane
KW  - RF discharge
KW  - RBS
KW  - ERD
KW  - FTIR
KW  - Polycarbonate
N2  - The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique.
ER  -

ZAJÍČKOVÁ, Lenka; Vratislav PEŘINA; Vilma BURŠÍKOVÁ; Anna MACKOVÁ and Jan JANČA. Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures. In \textit{Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases}. Miskolc - Lillafüred, Hungary: European Physical Society, 2000, p.~448-449.

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