New Method for the Complete Optical Analysis of Thin Films
Nonuniform in Optical Parameters

J 2003

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Petr KLAPETEK; Miloš JÁKL; Vladimír ČUDEK et al.

Základní údaje

Originální název

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Autoři

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Petr KLAPETEK; Miloš JÁKL; Vladimír ČUDEK a Marek ELIÁŠ

Vydání

Japanese Journal of Applied Physics, Tokyo, Institute of Pure and Applied Physics, 2003, 0021-4922

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Japonsko

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 1.171

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/03:00008288

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000184780100037

Klíčová slova anglicky

films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films

Štítky

optical characterization

Změněno: 9. 8. 2005 11:36, Mgr. Marek Eliáš, Ph.D.

Anotace

V originále

In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.

Návaznosti

GA101/01/1104, projekt VaV

Název: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Grantová agentura ČR, Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

GA202/01/1110, projekt VaV

Název: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Grantová agentura ČR, Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Citovat

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Petr KLAPETEK; Miloš JÁKL; Vladimír ČUDEK a Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. Japanese Journal of Applied Physics. Tokyo: Institute of Pure and Applied Physics, 2003, roč. 42, 7B, s. 4760-4765, 5 s. ISSN 0021-4922.

@article{490025,
   author = {Ohlídal, Miloslav and Ohlídal, Ivan and Klapetek, Petr and Jákl, Miloš and Čudek, Vladimír and Eliáš, Marek},
   article_location = {Tokyo},
   article_number = {7B},
   keywords = {films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films},
   language = {eng},
   issn = {0021-4922},
   journal = {Japanese Journal of Applied Physics},
   title = {New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters},
   volume = {42},
   year = {2003}
}

TY  - JOUR
ID  - 490025
AU  - Ohlídal, Miloslav - Ohlídal, Ivan - Klapetek, Petr - Jákl, Miloš - Čudek, Vladimír - Eliáš, Marek
PY  - 2003
TI  - New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters
JF  - Japanese Journal of Applied Physics
VL  - 42
IS  - 7B
SP  - 4760-4765
EP  - 4760-4765
PB  - Institute of Pure and Applied Physics
SN  - 00214922
KW  - films nonuniform in optical parameters
KW  - optical characterization
KW  - CN_x and SiO_y mixture films
N2  - In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.
ER  -

OHLÍDAL, Miloslav; Ivan OHLÍDAL; Petr KLAPETEK; Miloš JÁKL; Vladimír ČUDEK a Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. \textit{Japanese Journal of Applied Physics}. Tokyo: Institute of Pure and Applied Physics, 2003, roč.~42, 7B, s.~4760-4765, 5 s. ISSN~0021-4922.

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