| DE POUSQUES, Ludovic, Jean-Christiphe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULE-GAY a Michel TOUZEAU. Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma. In Prosseding of Ninth International Conference on Plasma Surface Engineering. Garmisch-Partenkirchen, Germany: Prosseding of Ninth International Conference on Plasma Surface Engineering, 2004, s. 23. |
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@inproceedings{572554,
author = {de Pousques, Ludovic and Imbert, JeanandChristiphe and Vašina, Petr and BoisseandLaporte, Caroline and TeuleandGay, Lionel and Touzeau, Michel},
address = {Garmisch-Partenkirchen, Germany},
booktitle = {Prosseding of Ninth International Conference on Plasma Surface Engineering},
keywords = {IPVD; microwave; RF; magnetron},
language = {eng},
location = {Garmisch-Partenkirchen, Germany},
pages = {23-23},
publisher = {Prosseding of Ninth International Conference on Plasma Surface Engineering},
title = {Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma},
year = {2004}
}
TY - JOUR
ID - 572554
AU - de Pousques, Ludovic - Imbert, Jean-Christiphe - Vašina, Petr - Boisse-Laporte, Caroline - Teule-Gay, Lionel - Touzeau, Michel
PY - 2004
TI - Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma
PB - Prosseding of Ninth International Conference on Plasma Surface Engineering
CY - Garmisch-Partenkirchen, Germany
KW - IPVD
KW - microwave
KW - RF
KW - magnetron
N2 - The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system
ER -
DE POUSQUES, Ludovic, Jean-Christiphe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULE-GAY a Michel TOUZEAU. Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma. In \textit{Prosseding of Ninth International Conference on Plasma Surface Engineering}. Garmisch-Partenkirchen, Germany: Prosseding of Ninth International Conference on Plasma Surface Engineering, 2004, s.~23.
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