Spatial characterization of an IPVD reactor: neutral gas
temperature and interpretation of optical spectroscopy
measurements

J 2005

Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

DE POUCQUES, Ludovic; Jean-Christophe IMBERT; Caroline BOISSE-LAPORTE; Petr VAŠINA; Jean BRETAGNE et. al.

Základní údaje

Originální název

Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Název česky

Prostorove rozlisena charakterizace IPVD reaktoru: teplota jako klicovy parametr pro interpretaci opticke emisni spektroskopie

Autoři

DE POUCQUES, Ludovic; Jean-Christophe IMBERT; Caroline BOISSE-LAPORTE; Petr VAŠINA; Jean BRETAGNE; Lionel TEULÉ-GAY a Michel TOUZEAU

Vydání

Plasma Sources Science and Technology, Bristol, Institute of Physics Publishing, 2005, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 1.798

Kód RIV

RIV/00216224:14310/05:00012907

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000229918100023

Klíčová slova anglicky

physical vapor deposition; ionised physical vapor deposition; titanium; metal ionisation; density; magnetron

Štítky

Density, ionised physical vapor deposition, magnetron, metal ionisation, physical vapor deposition, titanium

Změněno: 23. 2. 2006 16:05, prof. Mgr. Petr Vašina, Ph.D.

Anotace

ORIG CZ

V originále

This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy and Langmuir probe measurements. A rectangular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The influence of the microwave power (between 0 and 900 W) and the magnetron discharge current (0.5 and 2 A) on the densities of the titanium species (neutral and ionic), argon emission line intensity and titanium and argon temperature variations was investigated. The titanium temperature and densities were measured using the pulsed resonant absorption spectroscopy technique. The neutral and ion fluxes on the substrate were deduced from these measurements. It was found that the ratio phi(Ti+)/phi(Ti-n) increases by a factor of 30 when additional microwave plasma is used. Moreover, we point out the temperature as a key parameter in plasma diagnostic interpretations.

Česky

Studium IPVD reaktoru s Ti katodou. Teplota jako klicovy parametr pro interpretaci vysledku.

Návaznosti

GD202/03/H162, projekt VaV

Název: Pokročilé směry ve fyzice a chemii plazmatu

Investor: Grantová agentura ČR, Pokročilé směry ve fyzice a chemii plazmatu

MSM0021622411, záměr

Název: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Citovat

DE POUCQUES, Ludovic; Jean-Christophe IMBERT; Caroline BOISSE-LAPORTE; Petr VAŠINA; Jean BRETAGNE; Lionel TEULÉ-GAY a Michel TOUZEAU. Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2005, roč. 14, č. 2, s. 321-327. ISSN 0963-0252.

@article{596585,
   author = {de Poucques, Ludovic and Imbert, JeanandChristophe and BoisseandLaporte, Caroline and Vašina, Petr and Bretagne, Jean and TeuléandGay, Lionel and Touzeau, Michel},
   article_location = {Bristol},
   article_number = {2},
   keywords = {physical vapor deposition; ionised physical vapor deposition; titanium; metal ionisation; density; magnetron},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements},
   volume = {14},
   year = {2005}
}

TY  - JOUR
ID  - 596585
AU  - de Poucques, Ludovic - Imbert, Jean-Christophe - Boisse-Laporte, Caroline - Vašina, Petr - Bretagne, Jean - Teulé-Gay, Lionel - Touzeau, Michel
PY  - 2005
TI  - Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements
JF  - Plasma Sources Science and Technology
VL  - 14
IS  - 2
SP  - 321
EP  - 321
PB  - Institute of Physics Publishing
SN  - 09630252
KW  - physical vapor deposition
KW  - ionised physical vapor deposition
KW  - titanium
KW  - metal ionisation
KW  - density
KW  - magnetron
N2  - This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy and Langmuir probe measurements. A rectangular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The influence of the microwave power (between 0 and 900 W) and the magnetron discharge current (0.5 and 2 A) on the densities of the titanium species (neutral and ionic), argon emission line intensity and titanium and argon temperature variations was investigated. The titanium temperature and densities were measured using the pulsed resonant absorption spectroscopy technique. The neutral and ion fluxes on the substrate were deduced from these measurements. It was found that the ratio phi(Ti+)/phi(Ti-n) increases by a factor of 30 when additional microwave plasma is used. Moreover, we point out the temperature as a key parameter in plasma diagnostic interpretations.
ER  -

DE POUCQUES, Ludovic; Jean-Christophe IMBERT; Caroline BOISSE-LAPORTE; Petr VAŠINA; Jean BRETAGNE; Lionel TEULÉ-GAY a Michel TOUZEAU. Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements. \textit{Plasma Sources Science and Technology}. Bristol: Institute of Physics Publishing, 2005, roč.~14, č.~2, s.~321-327. ISSN~0963-0252.

Přehled o publikaci