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@inproceedings{773053,
author = {Dvořák, Pavel and Vašina, Petr},
address = {Granada},
booktitle = {19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts},
edition = {32 A},
keywords = {magnetron; reactive sputtering; plasma; discharge; higher harmonics;},
language = {eng},
location = {Granada},
isbn = {2-914771-04-5},
pages = {78P (topic 5)},
publisher = {European Physical Society},
title = {Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process},
url = {http://www.escampig2008.csic.es/},
year = {2008}
}
TY - JOUR
ID - 773053
AU - Dvořák, Pavel - Vašina, Petr
PY - 2008
TI - Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process
PB - European Physical Society
CY - Granada
SN - 2914771045
KW - magnetron
KW - reactive sputtering
KW - plasma
KW - discharge
KW - higher harmonics;
UR - http://www.escampig2008.csic.es/
N2 - The fundamental and the higher harmonics of the cathode voltage and of the uncompensated probe potential were used as a tool to control the reactive magnetron sputtering. It was shown that this methode is very sensitive and is suitable for the control of the deposition process.
ER -
DVOŘÁK, Pavel and Petr VAŠINA. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process. In \textit{19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts}. 32 A. Granada: European Physical Society, 2008, p.~78P (topic 5), 2 pp. ISBN~2-914771-04-5.
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