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@inproceedings{773053, author = {Dvořák, Pavel and Vašina, Petr}, address = {Granada}, booktitle = {19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts}, edition = {32 A}, keywords = {magnetron; reactive sputtering; plasma; discharge; higher harmonics;}, language = {eng}, location = {Granada}, isbn = {2-914771-04-5}, pages = {78P (topic 5)}, publisher = {European Physical Society}, title = {Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process}, url = {http://www.escampig2008.csic.es/}, year = {2008} }
TY - JOUR ID - 773053 AU - Dvořák, Pavel - Vašina, Petr PY - 2008 TI - Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process PB - European Physical Society CY - Granada SN - 2914771045 KW - magnetron KW - reactive sputtering KW - plasma KW - discharge KW - higher harmonics; UR - http://www.escampig2008.csic.es/ N2 - The fundamental and the higher harmonics of the cathode voltage and of the uncompensated probe potential were used as a tool to control the reactive magnetron sputtering. It was shown that this methode is very sensitive and is suitable for the control of the deposition process. ER -
DVOŘÁK, Pavel and Petr VAŠINA. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process. In \textit{19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts}. 32 A. Granada: European Physical Society, 2008, p.~78P (topic 5), 2 pp. ISBN~2-914771-04-5.
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