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@inproceedings{791596,
author = {Trunec, David and Šíra, Martin and Sťahel, Pavel and Buršíková, Vilma},
address = {Francie},
booktitle = {Proccedings of HAKONE X},
keywords = {electrical discharge; atmospheric pressure; nitrogen},
language = {eng},
location = {Francie},
pages = {1-5},
publisher = {University of Toulouse},
title = {DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE},
year = {2008}
}
TY - JOUR
ID - 791596
AU - Trunec, David - Šíra, Martin - Sťahel, Pavel - Buršíková, Vilma
PY - 2008
TI - DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE
PB - University of Toulouse
CY - Francie
KW - electrical discharge
KW - atmospheric pressure
KW - nitrogen
N2 - The atmospheric pressure homogeneous discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas and a small admixture of hexamethyldisiloxane which was used as a monomer. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between homogeneous and filamentary regime. Mechanical properties of deposited films were characterized by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes.
ER -
TRUNEC, David, Martin ŠÍRA, Pavel SŤAHEL a Vilma BURŠÍKOVÁ. DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE. In \textit{Proccedings of HAKONE X}. Francie: University of Toulouse, 2008, s.~1-5.
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