KELAR, Lukáš, Vilma BURŠÍKOVÁ and Zdeněk BOCHNÍČEK. Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD. In 2nd Central European Symposium on Plasma Chemistry. 2008.
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Basic information
Original name Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD
Name in Czech Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD
Authors KELAR, Lukáš, Vilma BURŠÍKOVÁ and Zdeněk BOCHNÍČEK.
Edition 2nd Central European Symposium on Plasma Chemistry, 2008.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
UT WoS 000208452600039
Keywords in English Preparation; characterisation; carbon films; HMDSZ; Methane; Nitrogen; Hydrogen; mixture; PECVD
Tags carbon films, characterisation, HMDSZ, Hydrogen, Methane, mixture, Nitrogen, PECVD, Preparation
Tags International impact
Changed by Changed by: Mgr. Adrian Stoica, Ph.D., učo 250983. Changed: 14/1/2009 14:15.
Abstract
Carbon films are often used in various applications. In case of HDLC (amorphous hydrogenated carbon) there may be a problem with internal stress in the film, which can cause cracking or delamination of all the film. It is known that silicon incorporation into the film decreases the internal stress in the film. The aim of the present work was to study the effect of the negative self-bias voltage and the HMDSZ (Si2NC6H19) content in the deposition mixture on the properties of thin films prepared from HMDSZ/methane/nitrogen or hydrogen or argon mixtures.
Abstract (in Czech)
Carbon films are often used in various applications. In case of HDLC (amorphous hydrogenated carbon) there may be a problem with internal stress in the film, which can cause cracking or delamination of all the film. It is known that silicon incorporation into the film decreases the internal stress in the film. The aim of the present work was to study the effect of the negative self-bias voltage and the HMDSZ (Si2NC6H19) content in the deposition mixture on the properties of thin films prepared from HMDSZ/methane/nitrogen or hydrogen or argon mixtures.
Links
GA202/07/1669, research and development projectName: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích
Investor: Czech Science Foundation, Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
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