| ELIÁŠ, Marek, Pavel SOUČEK a Petr VAŠINA. Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics. In Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8. Brno: Brno University of Technology, 2009, s. 87-87. ISBN 978-80-214-3875-0. |
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@inproceedings{838260,
author = {Eliáš, Marek and Souček, Pavel and Vašina, Petr},
address = {Brno},
booktitle = {Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8},
keywords = {hybrid PVD-PECVD},
language = {eng},
location = {Brno},
isbn = {978-80-214-3875-0},
pages = {87-87},
publisher = {Brno University of Technology},
title = {Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics},
year = {2009}
}
TY - JOUR
ID - 838260
AU - Eliáš, Marek - Souček, Pavel - Vašina, Petr
PY - 2009
TI - Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
PB - Brno University of Technology
CY - Brno
SN - 9788021438750
KW - hybrid PVD-PECVD
N2 - Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding
ER -
ELIÁŠ, Marek, Pavel SOUČEK a Petr VAŠINA. Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics. In \textit{Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8}. Brno: Brno University of Technology, 2009, s.~87-87. ISBN~978-80-214-3875-0.
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