| JÍŠA, Jan a Mojmír MEDUŇA. Towards limits of x-ray specular reflectivity. Materials Structure in Chemistry, Biology, Physics and Technology. Czech Republic: Czech and Slovak Crystallographic Associ, 2009, roč. 16, 2a, s. k60, 2 s. ISSN 1211-5894. |
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@article{862557,
author = {Jíša, Jan and Meduňa, Mojmír},
article_location = {Czech Republic},
article_number = {2a},
keywords = {x-ray reflectivity; fourier transform; photoresist},
language = {eng},
issn = {1211-5894},
journal = {Materials Structure in Chemistry, Biology, Physics and Technology},
title = {Towards limits of x-ray specular reflectivity},
volume = {16},
year = {2009}
}
TY - JOUR
ID - 862557
AU - Jíša, Jan - Meduňa, Mojmír
PY - 2009
TI - Towards limits of x-ray specular reflectivity
JF - Materials Structure in Chemistry, Biology, Physics and Technology
VL - 16
IS - 2a
SP - k60
EP - k60
PB - Czech and Slovak Crystallographic Associ
SN - 12115894
KW - x-ray reflectivity
KW - fourier transform
KW - photoresist
N2 - Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
ER -
JÍŠA, Jan a Mojmír MEDUŇA. Towards limits of x-ray specular reflectivity. \textit{Materials Structure in Chemistry, Biology, Physics and Technology}. Czech Republic: Czech and Slovak Crystallographic Associ, 2009, roč.~16, 2a, s.~k60, 2 s. ISSN~1211-5894.
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