| FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ a Pavel POKORNÝ. Optical characterization of HfO2 thin films. Thin Solid Films. Oxford, UK: Elsevier, 2011, roč. 519, č. 18, s. 6085–6091. ISSN 0040-6090. Dostupné z: https://dx.doi.org/10.1016/j.tsf.2011.03.128. |
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@article{966962,
author = {Franta, Daniel and Ohlídal, Ivan and Nečas, David and Vižďa, František and Caha, Ondřej and Hasoň, Martin and Pokorný, Pavel},
article_location = {Oxford, UK},
article_number = {18},
doi = {http://dx.doi.org/10.1016/j.tsf.2011.03.128},
keywords = {Optical properties; Ellipsometry; Spectrophotometry; Hafnium oxide; Transition-metal oxide; Urbach tail},
language = {eng},
issn = {0040-6090},
journal = {Thin Solid Films},
title = {Optical characterization of HfO2 thin films},
url = {http://www.sciencedirect.com/science/article/pii/S0040609011007863},
volume = {519},
year = {2011}
}
TY - JOUR
ID - 966962
AU - Franta, Daniel - Ohlídal, Ivan - Nečas, David - Vižďa, František - Caha, Ondřej - Hasoň, Martin - Pokorný, Pavel
PY - 2011
TI - Optical characterization of HfO2 thin films
JF - Thin Solid Films
VL - 519
IS - 18
SP - 6085–6091
EP - 6085–6091
PB - Elsevier
SN - 00406090
KW - Optical properties
KW - Ellipsometry
KW - Spectrophotometry
KW - Hafnium oxide
KW - Transition-metal oxide
KW - Urbach tail
UR - http://www.sciencedirect.com/science/article/pii/S0040609011007863
L2 - http://www.sciencedirect.com/science/article/pii/S0040609011007863
N2 - Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
ER -
FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ a Pavel POKORNÝ. Optical characterization of HfO2 thin films. \textit{Thin Solid Films}. Oxford, UK: Elsevier, 2011, roč.~519, č.~18, s.~6085–6091. ISSN~0040-6090. Dostupné z: https://dx.doi.org/10.1016/j.tsf.2011.03.128.
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