Masaryk University

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    2009

    1. Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
      VAŠINA, Petr and Pavel DVOŘÁK. Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process. Europhysics Letters. European Physical Society, 2009, vol. 85, No 1, p. 15002-15006. ISSN 0295-5075.
      Name in Czech: Analýza harmonických složek napětí v plazmatu jako nástroj kontrolu vf. naprašování
      RIV/00216224:14310/09:00029226 Article in a journal. Plasma physics and discharge through gases. English. France.
      Vašina, Petr (203 Czech Republic, guarantor) -- Dvořák, Pavel (203 Czech Republic)
      Keywords in English: higher harmonics; plasma; discharge; reactive sputtering; magnetron
      International impact: yes
      Reviewed: yes
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 24/6/2009 14:05.
      More: https://is.muni.cz/publication/824202/en
    2. Higher harmonics of plasma potential in capacitively coupled discharges
      DVOŘÁK, Pavel and Zdeněk MORAVEC. Higher harmonics of plasma potential in capacitively coupled discharges. In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009, p. 57. ISBN 978-80-214-3875-0.
      Name in Czech: Vyšší harmoniky potenciálu plazmatu kapacitně vázaných výbojů
      RIV/00216224:14310/09:00035970 Proceedings paper. Plasma physics and discharge through gases. English. Czech Republic.
      Dvořák, Pavel (203 Czech Republic, guarantor) -- Moravec, Zdeněk (203 Czech Republic)
      Keywords in English: higher harmonics; plasma; discharge; plasma potential
      Type of proceedings: pre-proceedings
      International impact: yes
      Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 24/6/2009 13:32.
      More: https://is.muni.cz/publication/838255/en
    3. Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
      VAŠINA, Petr and Pavel DVOŘÁK. Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009, p. 74. ISBN 978-80-214-3875-0.
      Name in Czech: Lze kontrolovat otravu terče při magnetronovém naprašování pomocí vyšších harmonických frekvencí výbojového napětí?
      RIV/00216224:14310/09:00029369 Proceedings paper. Plasma physics and discharge through gases. English. Czech Republic.
      Vašina, Petr (203 Czech Republic, guarantor) -- Dvořák, Pavel (203 Czech Republic)
      Keywords in English: higher harmonics; plasma; discharge; reactive sputtering; magnetron
      Type of proceedings: pre-proceedings
      International impact: yes
      Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 24/6/2009 13:46.
      More: https://is.muni.cz/publication/838257/en

    2008

    1. DEPENDENCE OF HIGHER HARMONIC FREQUENCIES MEASURED IN CAPACITIVELY COUPLED PLASMA ON THE MATCHING UNIT PARAMETERS
      DVOŘÁK, Pavel and Zdeněk MORAVEC. DEPENDENCE OF HIGHER HARMONIC FREQUENCIES MEASURED IN CAPACITIVELY COUPLED PLASMA ON THE MATCHING UNIT PARAMETERS. Chemické listy. Brno: Česká společnost chemická, 2008, vol. 102, s1311-1538, p. 1356 - 1359. ISSN 1803-2389.
      Name in Czech: Závislost vyšších harmonických frekvencí měřených v kapacitně vázaném výboji na parametrech přizpůsobovacího členu
      RIV/00216224:14310/08:00027076 Article in a journal. Plasma physics and discharge through gases. English. Czech Republic.
      Dvořák, Pavel (203 Czech Republic, guarantor) -- Moravec, Zdeněk (203 Czech Republic)
      Keywords in English: plasma; discharge; higher harmonics; capacitive; matching
      Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 22/12/2008 11:16.
      More: https://is.muni.cz/publication/800529/en
    2. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process
      DVOŘÁK, Pavel and Petr VAŠINA. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process. In 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts. 32 A. Granada: European Physical Society, 2008, p. 78P (topic 5), 2 pp. ISBN 2-914771-04-5.
      URL
      Name in Czech: Kontrola reaktivního naprašování pomocí analýzy harmonických frekvencí napětí vf. výboje
      RIV/00216224:14310/08:00024832 Proceedings paper. Plasma physics and discharge through gases. English. Spain.
      Dvořák, Pavel (203 Czech Republic, guarantor) -- Vašina, Petr (203 Czech Republic)
      Keywords in English: magnetron; reactive sputtering; plasma; discharge; higher harmonics;
      Type of proceedings: pre-proceedings
      International impact: yes
      Reviewed: yes
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 7/8/2008 09:52.
      More: https://is.muni.cz/publication/773053/en
    3. Higher harmonic frequencies measured in Capacitively Coupled Plasma
      DVOŘÁK, Pavel and Zdeněk MORAVEC. Higher harmonic frequencies measured in Capacitively Coupled Plasma. In 2nd CESPC - Book of extended abstracts. Brno: Ústav fyzikální elektroniky (PřF MU), JČM, 2008, p. 74.
      Name in Czech: Vyšší harmonické frekvence měřené v kapacitně vázaném plazmatu
      RIV/00216224:14310/08:00027077 Proceedings paper. Plasma physics and discharge through gases. English. Czech Republic.
      Dvořák, Pavel (203 Czech Republic, guarantor) -- Moravec, Zdeněk (203 Czech Republic)
      Keywords in English: plasma; higher harmonics
      Type of proceedings: pre-proceedings
      Changed by: doc. Mgr. Pavel Dvořák, Ph.D., učo 16711. Changed: 22/12/2008 11:27.
      More: https://is.muni.cz/publication/800530/en
    4. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process
      DVOŘÁK, Pavel and Petr VAŠINA. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process. In Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology. Praha: CVUT v Praze, 2008, p. 91-92, 1 pp. ISBN 978-80-01-04030-0.
      Name in Czech: Měření základní a vyšších harmonických frekvencí za účelem kontroly vf. reaktivního naprašování
      RIV/00216224:14310/08:00024835 Proceedings paper. Plasma physics and discharge through gases. English. Czech Republic.
      Dvořák, Pavel (203 Czech Republic, guarantor) -- Vašina, Petr (203 Czech Republic)
      Keywords in English: higher harmonics; plasma; discharge; reactive sputtering; magnetron
      Type of proceedings: pre-proceedings
      Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 7/8/2008 09:53.
      More: https://is.muni.cz/publication/773067/en
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