Analysis of the boundaries of ZrO2 and HfO2 thin films by
atomic force microscopy and the combined optical method

J 2002

Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

KLAPETEK, Petr; Ivan OHLÍDAL; Daniel FRANTA a Pavel POKORNÝ

Základní údaje

Originální název

Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

Autoři

KLAPETEK, Petr; Ivan OHLÍDAL; Daniel FRANTA a Pavel POKORNÝ

Vydání

Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 1.071

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/02:00006294

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000176852600004

Klíčová slova anglicky

ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries

Štítky

AFM, optical methods, rough upper boundaries, ZrO2 and Hfo2 films

Změněno: 18. 12. 2003 15:20, Mgr. Daniel Franta, Ph.D.

Anotace

V originále

In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced.

Návaznosti

GA101/01/1104, projekt VaV

Název: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Grantová agentura ČR, Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

GA202/01/1110, projekt VaV

Název: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Grantová agentura ČR, Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Citovat

KLAPETEK, Petr; Ivan OHLÍDAL; Daniel FRANTA a Pavel POKORNÝ. Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, roč. 34, č. 1, s. 559-564. ISSN 0142-2421.

@article{404727,
   author = {Klapetek, Petr and Ohlídal, Ivan and Franta, Daniel and Pokorný, Pavel},
   article_location = {USA},
   article_number = {1},
   keywords = {ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries},
   language = {eng},
   issn = {0142-2421},
   journal = {Surface and Interface Analysis},
   title = {Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method},
   url = {http://www.physics.muni.cz/~franta/bib/SIA34_559.html},
   volume = {34},
   year = {2002}
}

TY  - JOUR
ID  - 404727
AU  - Klapetek, Petr - Ohlídal, Ivan - Franta, Daniel - Pokorný, Pavel
PY  - 2002
TI  - Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
JF  - Surface and Interface Analysis
VL  - 34
IS  - 1
SP  - 559
EP  - 559
PB  - John Wiley & Sons
SN  - 01422421
KW  - ZrO2 and Hfo2 films
KW  - AFM
KW  - optical methods
KW  - rough upper boundaries
UR  - http://www.physics.muni.cz/~franta/bib/SIA34_559.html
N2  - In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced.
ER  -

KLAPETEK, Petr; Ivan OHLÍDAL; Daniel FRANTA a Pavel POKORNÝ. Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2002, roč.~34, č.~1, s.~559-564. ISSN~0142-2421.

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