Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

KLAPETEK, Petr, Ivan OHLÍDAL, Daniel FRANTA and Pavel POKORNÝ. Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, vol. 34, No 1, p. 559-564. ISSN 0142-2421.

Basic information

• Original name: Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
• Authors: KLAPETEK, Petr (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic) and Pavel POKORNÝ (203 Czech Republic).
• Edition: Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10302 Condensed matter physics
• Country of publisher: United States of America
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 1.071
• RIV identification code: RIV/00216224:14310/02:00006294
• Organization unit: Faculty of Science
• UT WoS: 000176852600004
• Keywords in English: ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries
• Tags: AFM, optical methods, rough upper boundaries, ZrO2 and Hfo2 films

Abstract

In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced.

Links

• GA101/01/1104, research and development project: Name: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry

• GA202/01/1110, research and development project: Name: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Czech Science Foundation, Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method