X-ray reflectivity study of a W/Si multilayer grating

J 2001

X-ray reflectivity study of a W/Si multilayer grating

JERGEL, M.; C. FALCONY; Petr MIKULÍK; L. ORTEGA; E. MAJKOVÁ et. al.

Základní údaje

Originální název

X-ray reflectivity study of a W/Si multilayer grating

Autoři

JERGEL, M.; C. FALCONY; Petr MIKULÍK; L. ORTEGA; E. MAJKOVÁ; E. PINČÍK; Š. LUBY; I. KOSTIČ a P. HUDEK

Vydání

Superficies y Vacío, Mexico, Sociedad Mexicana de Ciencia de Superfic, 2001, 1665-3521

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Mexiko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Kód RIV

RIV/00216224:14310/01:00006979

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

reflectivity; xrr; x-uv optics; gratings; w/si; x-ray

Štítky

gratings, reflectivity, w/si, x-ray, x-uv optics, xrr

Změněno: 27. 5. 2003 10:23, doc. RNDr. Petr Mikulík, Ph.D.

Anotace

V originále

Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.

Návaznosti

GA202/99/P064, projekt VaV

Název: Studium morfologie rozhraní epitaxních multivrstev RTG reflexí

Investor: Grantová agentura ČR, Studium morfologie rozhraní epitaxních multivrstev RTG reflexí

MSM 143100002, záměr

Název: Fyzikální vlastnosti nových materiálů a vrstevnatých struktur

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Fyzikální vlastnosti nových materiálů a vrstevnatých struktur

VS96102, projekt VaV

Název: Laboratoř tenkých vrstev a nanostruktur

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Laboratoř tenkých vrstev a nanostruktur

Citovat

JERGEL, M.; C. FALCONY; Petr MIKULÍK; L. ORTEGA; E. MAJKOVÁ; E. PINČÍK; Š. LUBY; I. KOSTIČ a P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. Superficies y Vacío. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, roč. 2001, č. 13, s. 10-14. ISSN 1665-3521.

@article{407469,
   author = {Jergel, M. and Falcony, C. and Mikulík, Petr and Ortega, L. and Majková, E. and Pinčík, E. and Luby, Š. and Kostič, I. and Hudek, P.},
   article_location = {Mexico},
   article_number = {13},
   keywords = {reflectivity; xrr; x-uv optics; gratings; w/si; x-ray},
   language = {eng},
   issn = {1665-3521},
   journal = {Superficies y Vacío},
   title = {X-ray reflectivity study of a W/Si multilayer grating},
   url = {http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001},
   volume = {2001},
   year = {2001}
}

TY  - JOUR
ID  - 407469
AU  - Jergel, M. - Falcony, C. - Mikulík, Petr - Ortega, L. - Majková, E. - Pinčík, E. - Luby, Š. - Kostič, I. - Hudek, P.
PY  - 2001
TI  - X-ray reflectivity study of a W/Si multilayer grating
JF  - Superficies y Vacío
VL  - 2001
IS  - 13
SP  - 10
EP  - 10
PB  - Sociedad Mexicana de Ciencia de Superfic
SN  - 16653521
KW  - reflectivity
KW  - xrr
KW  - x-uv optics
KW  - gratings
KW  - w/si
KW  - x-ray
UR  - http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001
N2  - Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.
ER  -

JERGEL, M.; C. FALCONY; Petr MIKULÍK; L. ORTEGA; E. MAJKOVÁ; E. PINČÍK; Š. LUBY; I. KOSTIČ a P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. \textit{Superficies y Vacío}. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, roč.~2001, č.~13, s.~10-14. ISSN~1665-3521.

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