| ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL a Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. Surface and Interface Analysis. USA: John Wiley & Sons, roč. 2004, č. 36, s. 1218-1221. ISSN 0142-2421. 2004. |
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@article{559741,
author = {Čechal, Jan and Tichopádek, Petr and Nebojsa, Alois and Bonaventurová Zrzavecká, Olga and Urbánek, Michal and Spousta, Jiří and Navrátil, Karel and Šikola, Tomáš},
article_location = {USA},
article_number = {36},
keywords = {spectroscopic ellipsometry; x-ray photoelectron spectroscopy; XPS; polysilanes; PMPSi},
language = {eng},
issn = {0142-2421},
journal = {Surface and Interface Analysis},
title = {In situ analysis of PMPSi by spectroscopic ellipsometry and XPS},
volume = {2004},
year = {2004}
}
TY - JOUR
ID - 559741
AU - Čechal, Jan - Tichopádek, Petr - Nebojsa, Alois - Bonaventurová Zrzavecká, Olga - Urbánek, Michal - Spousta, Jiří - Navrátil, Karel - Šikola, Tomáš
PY - 2004
TI - In situ analysis of PMPSi by spectroscopic ellipsometry and XPS
JF - Surface and Interface Analysis
VL - 2004
IS - 36
SP - 1218-1221
EP - 1218-1221
PB - John Wiley & Sons
SN - 01422421
KW - spectroscopic ellipsometry
KW - x-ray photoelectron spectroscopy
KW - XPS
KW - polysilanes
KW - PMPSi
N2 - In-situ monitoring of the UV-light and thermal treatment of PMPSi thin films by real-time spectroscopic ellipsometry and XPS is reported. The films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate that the Si-Si bonds in the polymer main chain were primarily broken at the UV-light treatment. However, the Si radicals recombined into the polymer-like chains causing no remarkable chemical shift. The UV-light treatment under enhanced sample temperature (~80C) in oxygen atmosphere resulted in the more intense degradation of the PMPSi film. This can be related to cutting off the volatile methyl groups from the polymer main chains.
ER -
ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL a Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, roč.~2004, č.~36, s.~1218-1221. ISSN~0142-2421. 2004.
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