ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL a Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. Surface and Interface Analysis. USA: John Wiley & Sons, 2004, roč. 2004, č. 36, s. 1218-1221. ISSN 0142-2421. |
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@article{559741, author = {Čechal, Jan and Tichopádek, Petr and Nebojsa, Alois and Bonaventurová Zrzavecká, Olga and Urbánek, Michal and Spousta, Jiří and Navrátil, Karel and Šikola, Tomáš}, article_location = {USA}, article_number = {36}, keywords = {spectroscopic ellipsometry; x-ray photoelectron spectroscopy; XPS; polysilanes; PMPSi}, language = {eng}, issn = {0142-2421}, journal = {Surface and Interface Analysis}, title = {In situ analysis of PMPSi by spectroscopic ellipsometry and XPS}, volume = {2004}, year = {2004} }
TY - JOUR ID - 559741 AU - Čechal, Jan - Tichopádek, Petr - Nebojsa, Alois - Bonaventurová Zrzavecká, Olga - Urbánek, Michal - Spousta, Jiří - Navrátil, Karel - Šikola, Tomáš PY - 2004 TI - In situ analysis of PMPSi by spectroscopic ellipsometry and XPS JF - Surface and Interface Analysis VL - 2004 IS - 36 SP - 1218-1221 EP - 1218-1221 PB - John Wiley & Sons SN - 01422421 KW - spectroscopic ellipsometry KW - x-ray photoelectron spectroscopy KW - XPS KW - polysilanes KW - PMPSi N2 - In-situ monitoring of the UV-light and thermal treatment of PMPSi thin films by real-time spectroscopic ellipsometry and XPS is reported. The films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate that the Si-Si bonds in the polymer main chain were primarily broken at the UV-light treatment. However, the Si radicals recombined into the polymer-like chains causing no remarkable chemical shift. The UV-light treatment under enhanced sample temperature (~80C) in oxygen atmosphere resulted in the more intense degradation of the PMPSi film. This can be related to cutting off the volatile methyl groups from the polymer main chains. ER -
ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL a Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2004, roč.~2004, č.~36, s.~1218-1221. ISSN~0142-2421.
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