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@book{596823,
author = {Franclová, Jana and Kučerová, Zuzana and Buršíková, Vilma},
address = {Praha},
edition = {1.},
keywords = {PECVD; Thin Films; Electrical Properties},
language = {eng},
location = {Praha},
isbn = {80-86732-59-2},
publisher = {MATFYZPRESS},
title = {Electrical Properties of Plasma Deposited Thin Films},
year = {2005}
}
TY - BOOK
ID - 596823
AU - Franclová, Jana - Kučerová, Zuzana - Buršíková, Vilma
PY - 2005
TI - Electrical Properties of Plasma Deposited Thin Films
VL - WDS 05, Proceedings of Contributed Papers, Part II
PB - MATFYZPRESS
CY - Praha
SN - 8086732592
KW - PECVD
KW - Thin Films
KW - Electrical Properties
N2 - It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD exhibited Pool-Frenkel conductivity (Schottky conductivity) at lower voltages and Fowler-Nordheim tunneling at higher voltages.
ER -
FRANCLOVÁ, Jana, Zuzana KUČEROVÁ and Vilma BURŠÍKOVÁ. \textit{Electrical Properties of Plasma Deposited Thin Films}. 1st ed. Praha: MATFYZPRESS, 2005, 4 pp. WDS 05, Proceedings of Contributed Papers, Part II. ISBN~80-86732-59-2.
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