F6400 Semiconductor technology laboratory

Faculty of Science
Autumn 2025
Extent and Intensity
0/0/2. 2 credit(s) (plus extra credits for completion). Type of Completion: z (credit).
In-person direct teaching
Teacher(s)
doc. RNDr. Petr Mikulík, Ph.D. (lecturer)
Guaranteed by
doc. RNDr. Petr Mikulík, Ph.D.
Department of Condensed Matter Physics – Physics Section – Faculty of Science
Contact Person: doc. RNDr. Petr Mikulík, Ph.D.
Supplier department: Department of Condensed Matter Physics – Physics Section – Faculty of Science
Course Enrolment Limitations
The course is also offered to the students of the fields other than those the course is directly associated with.
fields of study / plans the course is directly associated with
Abstract
The course allows students to perform a complete technological process leading to preparation of active semiconductor devices (diodes, transistors, test devices) on a silicon wafer in a clean room laboratory for microelectronics (class ISO 5). Analytical methods for structure characterization and electrical measurements will be applied during and after the process.
Learning outcomes
After completing the course, a student will be able to handle silicon wafers in a clean room environment, will have a practical experience with standard technology processes (lithography, oxidation, sputtering, ...) for device preparation typical for a modern chip production.
Key topics
  • Clean room facility and microelectronics.
  • Handling of silicon wafers.
  • Diodes, transistors, resistors, electronic devices, chips.
  • Oxidation, doping, sputtering.
  • Optical lithography.
  • Cleaning, etching.
  • Microscopy observation.
  • Thickness measurement.
  • Electrical measurements.
Study resources and literature
  • STREETMAN, Ben G. and Sanjay Kumar BANERJEE. Solid state electronic devices. Seventh edition, global edit. Boston: Pearson, 2016, 616 stran. ISBN 9781292060552. info
  • MACK, Chris A. Fundamental principles of optical lithography : the science of microfabrication. Hoboken, NJ: Wiley, 2007, xvii, 515. ISBN 9780470727300. info
  • WOLF, Stanley and Richard N. TAUBER. Silicon Processing for the VLSI Era. Sunset Beach, California, U.S.A.: Lattice Press, 1999, 960 pp. Vol. 1: Process Technology. ISBN 978-0961672164. info
Approaches, practices, and methods used in teaching
Laboratory project.
Method of verifying learning outcomes and course completion requirements
Credit is based on well written laboratory diary and presented measurements of the prepared devices.
Language of instruction
Czech
Further Comments
The course is taught annually.
The course is taught every week.
Teacher's information
https://www.physics.muni.cz/ufkl/equipment/CleanRoom.shtml
The course is also listed under the following terms Autumn 2011, Autumn 2011 - acreditation, spring 2012 - acreditation, Autumn 2012, Autumn 2013, Autumn 2014, Autumn 2015, Autumn 2016, autumn 2017, Autumn 2018, Autumn 2019, Autumn 2020, autumn 2021, Autumn 2022, Autumn 2023, Autumn 2024, Autumn 2026.
  • Enrolment Statistics (recent)
  • Permalink: https://is.muni.cz/course/sci/autumn2025/F6400