Další formáty:
BibTeX
LaTeX
RIS
@inproceedings{490899,
author = {Valtr, Miroslav and Zajíčková, Lenka and Buršíková, Vilma},
address = {Brno},
booktitle = {JUNIORMAT 03},
edition = {1. vyd.},
keywords = {plasma;DLC;films;methane;HMDSO;pecvd;radio frequency;discharge;FTIR;normalized absorbance},
language = {eng},
location = {Brno},
isbn = {80-214-2462-1},
pages = {58-59},
publisher = {ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie},
title = {Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO},
year = {2003}
}
TY - JOUR
ID - 490899
AU - Valtr, Miroslav - Zajíčková, Lenka - Buršíková, Vilma
PY - 2003
TI - Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO
PB - ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie
CY - Brno
SN - 8021424621
KW - plasma;DLC;films;methane;HMDSO;pecvd;radio frequency;discharge;FTIR;normalized absorbance
N2 - Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing.
ER -
VALTR, Miroslav, Lenka ZAJÍČKOVÁ a Vilma BURŠÍKOVÁ. Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO. In \textit{JUNIORMAT 03}. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2003, s.~58-59. ISBN~80-214-2462-1.
|
